Full Chip Lithographic Mask Generation
First Claim
1. A method for full integrated circuit (IC) mask pattern generation, comprising:
- generating, by a processor, an initial mask image from target polygons;
performing, by the processor, a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels;
determining performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization;
generating a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information; and
generating optimized mask patterns based on a localized polygon optimization of the mask.
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Abstract
A method, an apparatus, and a non-transitory computer readable medium for full chip mask pattern generation include: generating, by a processor, an initial mask image from target polygons, performing, by the processor, a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels, determining performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization, generating a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information, and generating optimized mask patterns based on a localized polygon optimization of the mask.
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Citations
20 Claims
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1. A method for full integrated circuit (IC) mask pattern generation, comprising:
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generating, by a processor, an initial mask image from target polygons; performing, by the processor, a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels; determining performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization; generating a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information; and generating optimized mask patterns based on a localized polygon optimization of the mask. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. An apparatus for full chip mask pattern generation, comprising:
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a memory; and a processor configured to execute instructions stored in the memory to; generate an initial mask image from target polygons; perform a global image based full chip optimization of the initial mask image to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels; determine performance index information based on the global image based full chip optimization, wherein the performance index information comprises data for assisting a global polygon optimization; generate a mask based on the global polygon optimization of the new mask pattern polygons using the performance index information; and generate optimized mask patterns based on a localized polygon optimization of the mask. - View Dependent Claims (18, 19)
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20. A non-transitory computer readable medium having stored thereon executable instructions for causing a processor to perform instructions to:
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generate an initial mask image from target polygons; perform a global image based full chip optimization of the initial mask image; store performance index information produced by the global image based full chip optimization to generate new mask pattern polygons, wherein the global image based full chip optimization co-optimizes main feature polygons and SRAF image pixels; generate a mask based on a global polygon optimization of the new mask pattern polygons using the performance index information; and generate optimized mask patterns based on a localized polygon optimization of the mask.
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Specification