MASK FOR DEPOSITION, APPARATUS FOR MANUFACTURING DISPLAY APPARATUS HAVING THE SAME, AND METHOD OF MANUFACTURING DISPLAY APPARATUS WITH MANUFACTURING DISPLAY APPARATUS HAVING MASK FOR DEPOSITION

• US 20170250208A1
• Filed: 01/16/2017
• Published: 08/31/2017
• Est. Priority Date: 02/29/2016
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: Kim, Sanghoon
• Granted Patent: US 10,083,997 B2
• Time in Patent Office: Days
• CPC Class Codes: B05C 21/005 Masking devices stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20
• CPC Class Codes: H01L 27/1259 Multistep manufacturing methods
• CPC Class Codes: H01L 27/127 with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask
• CPC Class Codes: H10K 59/12 Active-matrix OLED [AMOLED] displays
• CPC Class Codes: H10K 59/1201 Manufacture or treatment
• CPC Class Codes: H10K 71/166 using selective deposition, e.g. using a mask

Abstract

A deposition mask includes a deposition pattern through which a deposition material passes and a distal end extended in a length direction of the deposition mask from the deposition pattern. The distal end includes a dummy pattern between a clamping groove and the deposition pattern in the length direction. The clamping groove and the dummy pattern are provided in plural along a second direction crossing the length direction. In the length direction of the deposition mask, the number of clamping grooves and dummy patterns correspond to each other, the clamping grooves respectively overlap a corresponding dummy pattern, a distal end area at which clamping grooves overlap the corresponding dummy pattern defines a second area of the distal end, and a distal end area at which the clamping grooves do not overlap the corresponding dummy pattern defines a first area of the distal end to which a clamp is applied.

Claims

1. A deposition mask for depositing a deposition material on a substrate, comprising:

a deposition pattern unit comprising a plurality of deposition pattern holes through which the deposition material passes to the substrate; and

a distal end extended in a first direction of the deposition mask from the deposition pattern unit to a distal edge of the deposition mask, the distal end comprising;

a clamping groove open at the distal edge of the deposition mask; and

a dummy pattern unit disposed between the clamping groove and the deposition pattern unit in the first direction of the deposition mask;

wherein

the clamping groove and the dummy pattern unit are provided in plural along a second direction crossing the first direction of the deposition mask, and

in the first direction of the deposition mask,

a portion of each clamping groove overlaps a corresponding dummy pattern unit,

in the second direction of the deposition mask, the number of the clamping grooves and the number of the dummy pattern units correspond to each other,

an area of the distal end at which the portion of the distal end does not overlap the corresponding dummy pattern unit defines a first area of the distal end to which a clamp is applied, and

an area of the distal end at which the portion of each clamping groove overlaps the corresponding dummy pattern unit defines a second area of the distal end.

2. The deposition mask of claim 1, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes corresponds to a shape of one of the plurality of the deposition pattern holes.

3. The deposition mask of claim 1, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes is different from a shape of one of the plurality of the deposition pattern holes.

4. The deposition mask of claim 1, wherein

in the first direction of the deposition mask, the dummy pattern unit comprises a first dummy pattern unit and a second dummy pattern unit spaced apart from each other, each of the first and second dummy pattern units comprising a plurality of dummy pattern holes.

5. An apparatus for manufacturing a pattern on a substrate of a display apparatus, the apparatus comprising:

a deposition mask frame assembly facing the substrate; and

a deposition source facing the deposition mask frame assembly to dispose the deposition mask frame assembly between the substrate and the deposition source,

wherein the deposition mask frame assembly comprises;

a frame comprising an opening at a center portion thereof;

a deposition mask which is installed on the frame to face the substrate, a length of the deposition mask extended in a first direction; and

a support of which a length thereof extends in a second direction crossing the first direction and across the opening of the frame, the support overlapping a portion of the deposition mask and supporting the deposition mask which is installed on the frame,

wherein the deposition mask is extendable along the first direction thereof by a force applied thereto by a clamp attached to the deposition mask, the deposition mask comprising;

a deposition pattern unit comprising a plurality of deposition pattern holes through which a deposition material for forming the pattern passes to the substrate; and

a distal end to which the clamp is attached, the distal end extended in the first direction of the deposition mask from the deposition pattern unit to a distal edge of the deposition mask, the distal end comprising;

a clamping groove open at the distal edge of the deposition mask; and

a dummy pattern unit disposed between the clamping groove and the deposition pattern unit in the first direction of the deposition mask,

wherein

the clamping groove and the dummy pattern unit are provided in plural along the second direction, and

in the first direction of the deposition mask,

 

a portion of each clamping groove overlaps a corresponding dummy pattern unit,

 

in the second direction of the deposition mask,

 

the number of the clamping grooves and the number of the dummy pattern units correspond to each other,

 

an area of the distal end at which the portion of distal end does not overlap the corresponding dummy pattern unit defines a first area of the distal end to which a clamp is applied, and

 

an area of the distal end at which the portion of each clamping groove overlaps the corresponding dummy pattern unit defines a second area of the distal end.

6. The apparatus of claim 5, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes corresponds to a shape of one of the plurality of the deposition pattern holes.

7. The apparatus of claim 5, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes is different from a shape of one of the plurality of the deposition pattern holes.

8. The apparatus of claim 5, wherein

in the first direction of the deposition mask, the dummy pattern unit comprises a first dummy pattern unit and a second dummy pattern unit spaced apart from each other, each of the first dummy pattern unit and second dummy pattern unit comprising a plurality of dummy pattern holes.

9. The apparatus of claim 5, wherein

the deposition mask frame assembly further comprises a welding portion which couples the frame and the deposition mask to each other, and

the welding portion is disposed at the distal end of the deposition mask.

10. The apparatus of claim 9, wherein in the first direction of the deposition mask, the welding portion is disposed between the pattern unit and the dummy pattern unit.

11. A method of manufacturing a display apparatus having a pattern on a substrate, the method comprising:

inserting the substrate and a deposition mask assembly into an inside of a deposition chamber;

aligning the substrate and the deposition mask frame assembly with each other; and

depositing on the substrate a deposition material for forming the pattern, by ejecting the deposition material from a deposition source and passing the ejected deposition material through the deposition mask frame assembly to the substrate,

wherein the deposition mask frame assembly comprises;

a frame comprising an opening at a center portion thereof;

a deposition mask which is installed on the frame to face the substrate, a length of the deposition mask extended in a first direction; and

a support of which a length thereof extends in a second direction crossing the first direction and across the opening of the frame, the support overlapping a portion of the deposition mask and supporting the deposition mask which is installed on the frame,

wherein the deposition mask is extendable along the first direction thereof by a force applied thereto by a clamp attached to the deposition mask, the deposition mask comprising;

a deposition pattern unit comprising a plurality of deposition pattern holes, through which the ejected deposition material passes to the substrate; and

a distal end to which the clamp is attached, the distal end extended in the first direction of the deposition mask from the deposition pattern unit to a distal edge of the deposition mask, the distal end comprising;

a clamping groove open at the distal edge of the deposition mask; and

a dummy pattern unit disposed between the clamping groove and the deposition pattern unit in the first direction of the deposition mask, and

wherein

the clamping groove and the dummy pattern unit are provided in plural along the second direction; and

in the first direction of the deposition mask,

 

a portion of each clamping groove overlaps a corresponding dummy pattern unit,

 

in the second direction of the deposition mask, the number of the clamping grooves and the number of the dummy pattern units correspond to each other,

 

an area of the distal end at which the portion of the distal end does not overlap the corresponding dummy pattern unit defines a first area of the distal end to which a clamp is applied, and

 

an area of the distal end at which the portion of each clamping groove overlaps the corresponding dummy pattern unit defines a second area of the distal end.

12. The method of claim 11, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes corresponds to a shape of one of the plurality of the deposition pattern holes.

13. The method of claim 11, wherein

the dummy pattern unit comprises a plurality of dummy pattern holes, and

a shape of one of the plurality of dummy pattern holes is different from a shape of one of the plurality of the deposition pattern holes.

14. The method of claim 11, wherein

in the length direction of the deposition mask, the dummy pattern unit comprises a first dummy pattern unit and a second dummy pattern unit spaced apart from each other, each of the first and second dummy pattern units comprising a plurality of dummy pattern holes.

15. The method of claim 11, wherein

the deposition mask frame assembly further comprises a welding portion which couples the frame and the deposition mask to each other, and

the welding portion is disposed at the distal end of the deposition mask.

16. The method of claim 15, wherein in the first direction of the deposition mask, the welding portion is disposed between the pattern unit and the dummy pattern unit.