Display Substrate

• US 20170261806A1
• Filed: 01/29/2016
• Published: 09/14/2017
• Est. Priority Date: 08/25/2015
• Status: Active Grant

• Current Assignee: BOE Technology Group Co., Ltd.
• Original Assignee: BOE Technology Group Co., Ltd.
• Inventors: Niu, Jing, Qi, Yonglian, Sun, Shuang, Zhang, Fangzhen
• Granted Patent: US 10,209,557 B2
• Time in Patent Office: Days
• CPC Class Codes: G02B 5/3058 comprising electrically conductive elements, e.g. wire grids, conductive particles
• CPC Class Codes: G02F 1/133357 Planarisation layers
• CPC Class Codes: G02F 1/133512 Light shielding layers, e.g. black matrix G02F1/136209 takes precedence
• CPC Class Codes: G02F 1/133516 Methods for their manufacture, e.g. printing, electro-deposition or photolithography
• CPC Class Codes: G02F 1/133528 Polarisers
• CPC Class Codes: G02F 1/133548 Wire-grid polarisers
• CPC Class Codes: G02F 1/133617 Illumination with ultraviolet light; Luminescent elements or materials associated to the cell
• CPC Class Codes: G02F 1/136209 Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
• CPC Class Codes: G02F 1/1368 in which the switching element is a three-electrode device G02F1/136277 takes precedence
• CPC Class Codes: G03F 7/0002 Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
• CPC Class Codes: G03F 7/0007 Filters, e.g. additive colour filters; Components for display devices
• CPC Class Codes: G03F 7/2043 with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists

Abstract

Disclosed is a display substrate, which includes a base substrate and a polarization layer, wherein the polarization layer includes grid polarizer (GPs) and light-shielding matrixes arranged in a same layer and made from a same material. The display substrate simplifies the production process, reduces the cost and reduces the thickness of a liquid crystal display (LCD) device.

Claims

1. A display substrate, comprising a base substrate and a polarization layer, wherein

the polarization layer comprises grid polarizers (GPs) and light-shielding matrixes arranged in a same layer and made from a same material.

2. The display substrate according to claim 1, wherein the display substrate is a color filter (CF) substrate;

and the CF substrate further comprises a quantum dot layer and a planarization layer disposed between the quantum dot layer and the polarization layer.

3. The display substrate according to claim 1, wherein the display substrate is an array substrate, and the array substrate further comprises thin-film transistors (TFTs) arranged in an array.

4. The display substrate according to claim 1, wherein the GPs and the light-shielding matrixes in the polarization layer are made from a same metallic material.

5. The display substrate according to claim 4, wherein the metallic material is any one selected from the group consisting of:

Al, Cu, Au, Ag and Cr.

6. The display substrate according to claim 2, wherein the planarization layer is made from a resin material containing polar bonds.

7. The display substrate according to claim 6, wherein the polar bonds are selected from the group consisting of:

hydroxyls, carboxyls, carbonyls, ether bonds, isocyanate groups and urethanos.

8. The display substrate according to claim 7, wherein the resin material containing the polar bonds is any one selected from the group consisting of:

epoxy resins, phenolic resins, urea resins, acrylic resins, polyvinyl alcohol, polyurethane, rubber, vinyl acetate and copolymers thereof, polystyrene and copolymers thereof, organo-silicon compounds and epoxy phenolic resins.

9. The display substrate according to claim 2, wherein an adhesive layer is disposed between the polarization layer and the planarization layer.

10. The display substrate according to claim 9, wherein a material of the adhesive layer includes at least one of indium tin oxide (ITO) and indium zinc oxide (IZO).

11. The display substrate according to claim 2, wherein a material of the quantum dot layer is any one selected from the group consisting of:

CdS, CdSe, CdTe, ZnO, ZnS, ZnSe, ZnTe, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InSb, AlAs, AlP, CuInS, CuInSe and AlSb.

12. The display substrate according to claim 2, further comprising:

spacers, wherein the spacers are arranged on one side of the display substrate opposite to the base substrate.

13. The display substrate according to claim 2, wherein the quantum dot layer includes a plurality of quantum dot CF units.

14. A liquid crystal display (LCD) device, comprising the display substrate according to claim 1.

15. A method for manufacturing a display substrate, comprising:

providing a base substrate and depositing a metal film on the base substrate; and

processing the metal film to form grid polarizers (GPs) and light-shielding matrixes.

16. The method according to claim 15, comprising:

providing the base substrate;

forming a patterned quantum dot layer on the base substrate;

forming a planarization layer on the patterned quantum dot layer;

depositing the metal film on the planarization layer; and

processing the metal film to form the GPs and light-shielding matrixes.

17. The method according to claim 15, wherein processing the metal film to form the GPs and the light-shielding matrixes includes:

coating photoresist on the metal film;

impressing a mask on the photoresist to form a structure corresponding to the GPs and the light-shielding matrixes;

demoulding and removing residual photoresist, and exposing the metal film; and

etching the metal film and to form the GPs and the light-shielding matrixes.

19. The method according to claim 15, wherein a material of the metal film is selected from the group consisting of Al, Cu, Au, Ag and Cr.

20. The method according to claim 16, after forming the planarization layer on the patterned quantum dot layer and before depositing the metal film, further comprising:

forming an adhesive layer and depositing the metal film on the adhesive layer.

21. The method according to claim 20, wherein a material of the adhesive layer is selected from ITO or IZO.

18. (canceled)