Bipolar Semiconductor Device Having Localized Enhancement Regions
First Claim
1. A bipolar semiconductor device comprising a plurality of unit cells, each of said plurality of unit cells comprising:
- a drift region having a first conductivity type situated over an anode layer having a second conductivity type opposite said first conductivity type;
a first control trench extending through an inversion region having said second conductivity type, and further extending into said drift region, said first control trench adjacent to cathode diffusions;
first and second depletion trenches, each having a depletion electrode;
said first depletion trench being situated between said second depletion trench and said first control trench;
an enhancement region having said first conductivity type localized in said drift region between said first and second depletion trenches, so that said enhancement region is not situated adjacent said first control trench or between said first depletion trench and said first control trench.
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Accused Products
Abstract
There are disclosed herein various implementations of a bipolar semiconductor device having localized enhancement regions. Such a bipolar semiconductor device includes a drift region having a first conductivity type situated over an anode layer having a second conductivity type opposite the first conductivity type. The bipolar semiconductor device also includes a first control trench extending through an inversion region having the second conductivity type, and further extending into the drift region, the first control trench being adjacent to cathode diffusions. In addition, the bipolar semiconductor device includes first and second depletion trenches, each having a depletion electrode, the first depletion trench being situated between the second depletion trench and the first control trench. An enhancement region having the first conductivity type is localized in the drift region between the first and second depletion trenches. In one implementation, the bipolar semiconductor device may be an insulated-gate bipolar transistor (IGBT).
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Citations
22 Claims
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1. A bipolar semiconductor device comprising a plurality of unit cells, each of said plurality of unit cells comprising:
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a drift region having a first conductivity type situated over an anode layer having a second conductivity type opposite said first conductivity type; a first control trench extending through an inversion region having said second conductivity type, and further extending into said drift region, said first control trench adjacent to cathode diffusions; first and second depletion trenches, each having a depletion electrode; said first depletion trench being situated between said second depletion trench and said first control trench; an enhancement region having said first conductivity type localized in said drift region between said first and second depletion trenches, so that said enhancement region is not situated adjacent said first control trench or between said first depletion trench and said first control trench. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 21)
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11. An insulated-gate bipolar transistor (IGBT) comprising a plurality of IGBT unit cells, each of said plurality of IGBT unit cells comprising:
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a drift region having a first conductivity type situated over a collector having a second conductivity type opposite said first conductivity type; a first gate trench extending through a base having said second conductivity type, and further extending into said drift region, said gate trench adjacent to emitter diffusions; first and second depletion trenches, each having a depletion electrode; said first depletion trench being situated between said second depletion trench and said first gate trench; an enhancement region having said first conductivity type localized in said drift region between said first and second depletion trenches, so that said enhancement region is not situated adjacent said first gate trench or between said first depletion trench and said first gate trench. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 22)
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Specification