DC Magnetron Sputtering
First Claim
Patent Images
1. A DC magnetron sputtering apparatus for depositing a film on a substrate comprising:
- a chamber;
a substrate support positioned within the chamber;
a DC magnetron; and
an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support;
in which the substrate support comprises a central region surrounded by an edge region, the central region being raised with respect to the edge region.
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Abstract
A DC magnetron sputtering apparatus is for depositing a film on a substrate. The apparatus includes a chamber, a substrate support positioned within the chamber, a DC magnetron, and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support. The substrate support includes a central region surrounded by an edge region, the central region being raised with respect to the edge region.
10 Citations
16 Claims
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1. A DC magnetron sputtering apparatus for depositing a film on a substrate comprising:
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a chamber; a substrate support positioned within the chamber; a DC magnetron; and an electrical signal supply device for supplying an electrical bias signal that, in use, causes ions to bombard a substrate positioned on the substrate support; in which the substrate support comprises a central region surrounded by an edge region, the central region being raised with respect to the edge region. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of depositing a film on a substrate comprising the steps of:
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positioning the substrate on a substrate support in a chamber; and
depositing the film on the substrate using a DC magnetron sputtering process in which an electrical bias signal causes ions to bombard the substrate;in which the substrate support comprises a central region surrounded by an edge region, the central region being raised with respect to the edge region, and the substrate is positioned on the central region so that a portion of the substrate overlays the edge region and is spaced apart therefrom. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16)
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Specification