3D SEMICONDUCTOR STRUCTURE AND DEVICE
First Claim
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1. A 3D structure, the structure comprising:
- a first stratum overlaid by a second stratum, said second stratum is less than two microns thick,wherein said first stratum comprises an array of memory cells comprising at least four rows of memory cells, each of said rows is controlled by a bit-line,wherein said array of memory cells comprises a plurality of columns of memory cells, each of said columns is controlled by a word-line, andwherein said second stratum comprises memory control circuits directly connected to said bit-lines and said word-lines.
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Abstract
A 3D structure, the structure including: a first stratum overlaid by a second stratum, the second stratum is less than two microns thick, where the first stratum includes an array of memory cells including at least four rows of memory cells, each of the rows is controlled by a bit-line, where the array of memory cells includes a plurality of columns of memory cells, each of the columns is controlled by a word-line, and where the second stratum includes memory control circuits directly connected to the bit-lines and the word-lines.
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20 Claims
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1. A 3D structure, the structure comprising:
a first stratum overlaid by a second stratum, said second stratum is less than two microns thick, wherein said first stratum comprises an array of memory cells comprising at least four rows of memory cells, each of said rows is controlled by a bit-line, wherein said array of memory cells comprises a plurality of columns of memory cells, each of said columns is controlled by a word-line, and wherein said second stratum comprises memory control circuits directly connected to said bit-lines and said word-lines. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A 3D structure, the structure comprising:
a first stratum overlaid by a second stratum, said second stratum is less than two microns thick, wherein said first stratum comprises an array of memory cells comprising at least four rows of memory cells, each of said rows is controlled by a bit-line, wherein said array of memory cells comprises a plurality of columns of memory cells, each of said columns is controlled by a word-line, wherein said second stratum comprises memory control circuits directly connected to control said memory cells, wherein said 3D structure is designed such that it could be processed to form a first 3D device and a second 3D device, and wherein said first 3D device comprises many more memory cells than said second 3D device. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A 3D structure, the structure comprising:
a first stratum overlaid by a second stratum, said second stratum is less than two microns thick, wherein said first stratum comprises an array of memory cells comprising at least four rows of memory cells, each of said rows is controlled by a bit-line, wherein said array of memory cells comprises a plurality of columns of memory cells, each of said columns is controlled by a word-line, wherein said second stratum comprises memory control circuits directly connected to control said memory cells, and wherein said 3D structure is designed to perform self-test and repair itself partly by activating a built-in redundancy. - View Dependent Claims (16, 17, 18, 19, 20)
Specification