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SELECTIVE DEPOSITION USING HYDROPHOBIC PRECURSORS

  • US 20170323776A1
  • Filed: 04/28/2017
  • Published: 11/09/2017
  • Est. Priority Date: 05/05/2016
  • Status: Active Grant
First Claim
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1. A vapor deposition process for selectively depositing a material on a first surface of a substrate relative to a second organic surface, the method comprising:

  • contacting the substrate with a first vapor phase hydrophobic reactant; and

    contacting substrate with a second vapor phase reactant,wherein the material is deposited selectively on the first surface relative to the second organic surface.

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