SELECTIVE DEPOSITION USING HYDROPHOBIC PRECURSORS
First Claim
1. A vapor deposition process for selectively depositing a material on a first surface of a substrate relative to a second organic surface, the method comprising:
- contacting the substrate with a first vapor phase hydrophobic reactant; and
contacting substrate with a second vapor phase reactant,wherein the material is deposited selectively on the first surface relative to the second organic surface.
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Accused Products
Abstract
Vapor deposition processes are provided in which a material is selectively deposited on a first surface of a substrate relative to a second organic surface. In some embodiments a substrate comprising a first surface, such as a metal, semi-metal or oxidized metal or semi-metal is contacted with a first vapor phase hydrophobic reactant and a second vapor phase reactant such that the material is deposited selectively on the first surface relative to the second organic surface. The second organic surface may comprise, for example, a self-assembled monolayer, a directed self-assembled layer, or a polymer, such as a polyimide, polyamide, polyuria or polystyrene. The material that is deposited may be, for example, a metal or metallic material. In some embodiments the material is a metal oxide, such as ZrO2 or HfO2. In some embodiments the vapor deposition process is a cyclic chemical vapor deposition (CVD) process or an atomic layer deposition (ALD) process. In some embodiments the material is deposited on the first surface relative to the second surface with a selectivity of greater than about 50%, greater than about 60%, greater than about 70%, greater than about 80%, greater than about 90% or greater than about 95%.
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Citations
23 Claims
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1. A vapor deposition process for selectively depositing a material on a first surface of a substrate relative to a second organic surface, the method comprising:
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contacting the substrate with a first vapor phase hydrophobic reactant; and contacting substrate with a second vapor phase reactant, wherein the material is deposited selectively on the first surface relative to the second organic surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for selectively depositing a metal oxide on a first surface of a substrate relative to a second surface, the method comprising:
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contacting substrate with a first hydrophobic reactant comprising metal; and contacting substrate with a second reactant, wherein the first substrate surface comprises a metal or semimetal containing material and the second substrate surface comprises an organic material. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23)
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Specification