ENHANCED DIGITAL LIGHT PROCESSING-BASED MASK PROJECTION STEREOLITHOGRAPHY METHOD AND APPARATUS
First Claim
1. An enhanced digital light processing-based mask projection stereolithography apparatus (20), comprising:
- a control platform (206) capable of slicing a model of a to-be-prototyped object into layers, converting a layer into a bitmap, and further dividing the layer into a main body area (301) and boundary filling areas (305, 306, 307, 308);
a digital light processing unit (203) that is controlled by the control platform (206) and capable of emitting a first light beam (208) used for the corresponding main body area (301) of the layer of the to-be-prototyped object; and
a laser marking unit (205) that is controlled by the control platform (206) and capable of emitting a second light beam (209) used for the corresponding boundary filling areas (305, 306, 307, 308) of the layer of the to-be-prototyped object.
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Accused Products
Abstract
An enhanced digital light processing-based mask projection stereolithography method and apparatus are disclosed, where the apparatus comprises: a control platform capable of slicing a model of a to-be-prototyped object into layers, converting the layer into a bitmap, and further dividing the layer into a main body area and boundary filling areas; a digital light processing unit that is controlled by the control platform and capable of emitting a first light beam used for the corresponding main body area of the layer of the to-be-prototyped object; and a laser marking unit that is controlled by the control platform and capable of emitting a second light beam used for the corresponding boundary filling areas of the layer of the to-be-prototyped object. The present invention can not only implement high-speed prototyping but also avoid an edge distortion, thereby improving precision of object prototyping.
7 Citations
13 Claims
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1. An enhanced digital light processing-based mask projection stereolithography apparatus (20), comprising:
- a control platform (206) capable of slicing a model of a to-be-prototyped object into layers, converting a layer into a bitmap, and further dividing the layer into a main body area (301) and boundary filling areas (305, 306, 307, 308);
a digital light processing unit (203) that is controlled by the control platform (206) and capable of emitting a first light beam (208) used for the corresponding main body area (301) of the layer of the to-be-prototyped object; and
a laser marking unit (205) that is controlled by the control platform (206) and capable of emitting a second light beam (209) used for the corresponding boundary filling areas (305, 306, 307, 308) of the layer of the to-be-prototyped object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
- a control platform (206) capable of slicing a model of a to-be-prototyped object into layers, converting a layer into a bitmap, and further dividing the layer into a main body area (301) and boundary filling areas (305, 306, 307, 308);
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9. An enhanced digital light processing-based mask projection stereolithography method, comprising the following steps:
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slicing a model of a to-be-prototyped object into layers, converting a layer into a bitmap, and further dividing the layer into a main body area and boundary filling areas; prototyping, by using a digital light processing unit, the corresponding main body area of the layer of the to-be-prototyped object; and prototyping, by using a laser marking unit, the corresponding boundary filling areas of the layer of the to-be-prototyped object. - View Dependent Claims (10, 11, 12, 13)
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Specification