LASER WELDED GLASS PACKAGES AND METHODS OF MAKING

• US 20170327419A1
• Filed: 10/29/2015
• Published: 11/16/2017
• Est. Priority Date: 10/31/2014
• Status: Active Grant

• Current Assignee: Corning Incorporated
• Original Assignee: Corning Incorporated
• Inventors: Boek, Heather Debra, Dabich, II, Leonard Charles, Deneka, David Alan, Kim, Jin Su, Koval, Shari Elizabeth, Logunov, Stephan Lvovich, Quesada, Mark Alejandro, Streltsov, Alexander Mikhailovich
• Granted Patent: US 10,457,595 B2
• Time in Patent Office: Days
• CPC Class Codes: C01G 19/02 Oxides
• CPC Class Codes: C03C 15/00 Surface treatment of glass, not in the form of fibres or filaments, by etching etching or surface-brightening compositions, in general C09K13/00
• CPC Class Codes: C03C 17/02 with glass C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/06 with metals C03C17/34, C03C17/44 take precedence
• CPC Class Codes: C03C 17/23 Oxides C03C17/02 takes precedence
• CPC Class Codes: C03C 23/0025 by a laser beam
• CPC Class Codes: C03C 27/044 of glass, glass-ceramic or ceramic material only
• CPC Class Codes: C03C 27/06 Joining glass to glass by processes other than fusing fusing C03B23/20; units for use as elements for closing wall or like openings and comprising two or more parallel glass panes in spaced relationship, the panes being permanently secured together E06B3/66
• CPC Class Codes: C03C 27/10 with the aid of adhesive specially adapted for that purpose
• CPC Class Codes: C03C 3/14 containing boron
• CPC Class Codes: C03C 3/16 containing phosphorus
• CPC Class Codes: C03C 3/23 containing halogen and at least one oxide, e.g. oxide of boron
• CPC Class Codes: C03C 3/247 containing fluorine and phosphorus
• CPC Class Codes: H10K 50/8426 Peripheral sealing arrangements, e.g. adhesives, sealants

Abstract

A method of forming a sealed device comprising providing a first substrate having a first surface, providing a second substrate adjacent the first substrate, and forming a weld between an interface of the first substrate and the adjacent second substrate, wherein the weld is characterized by ((σ_{tensile stress location})/(σ_{interface laser weld}))<<1 or <1 and σ_{interface laser weld}>10 MPa or >1 MPa where σ_{tensile stress location} is the stress present in the first substrate and σ_{interface laser weld} is the stress present at the interface. This method may be used to manufacture a variety of different sealed packages.

Claims

1-34. -34. (canceled)

35. An apparatus comprising:

a first substrate having a first surface;

a second substrate adjacent the first substrate; and

a weld formed between an interface of the first substrate and the adjacent second substrate,

wherein the weld is characterized by

37. The apparatus of claim 35 or 36 further comprising:

an inorganic film formed over the first surface of the first substrate; and

a device protected between the first substrate and the second substrate wherein the inorganic film is in contact with the second substrate.

38. The apparatus of claim 37, wherein each of the inorganic film, first substrate and second substrate are transmissive at approximately 420 nm to approximately 750 nm.

39. The apparatus of claim 37, wherein absorption of the inorganic film is more than 10% at a predetermined laser wavelength.

40. The apparatus of claim 37, wherein the composition of the inorganic film is selected from the group consisting of SnO₂, ZnO, TiO₂, ITO, Zn, Ti, Ce, Pb, Fe, Va, Cr, Mn, Mg, Ge, SnF₂, ZnF₂ and combinations thereof.

41. The apparatus of claim 37, wherein the composition of the inorganic film is selected to lower the activation energy for inducing creep flow of the first substrate, the second substrate, or both the first and second substrates.

42. The apparatus of claim 37, wherein the composition of the inorganic film is a laser absorbing low liquidus temperature material with a liquidus temperature less than or equal to about 1000°

C.

43. The apparatus of claim 37, wherein the composition of the inorganic film comprises:

20-100 mol % SnO;

0-50 mol % SnF₂; and

0-30 mol % P₂O₅ or B₂O₃.

44. The apparatus of claim 37, wherein the inorganic film and the first and second substrates have a combined internal transmission of more than 80% at approximately 420 nm to approximately 750 nm.

36. An apparatus comprising:

a first substrate having a first surface;

a second substrate adjacent the first substrate; and

a weld formed between an interface of the first substrate and the adjacent second substrate,

wherein the weld is characterized by

45. A method of forming a vacuum insulated glass window comprising the steps of:

providing a first glass substrate having a first surface and a first edge;

providing a first plurality of spacers on the first surface;

providing a second plurality of shims along a the first edge of the first glass substrate;

bringing a second glass substrate having a second surface and a second edge in contact with the first plurality of spacers and the second plurality of shims so that the first and second glass substrates are spaced apart by a first distance between the first and second surfaces;

laser sealing the first glass substrate to the second glass substrate along the first and second edges to define an interior region between the first and second glass substrates; and

forming a vacuum pressure of less than one atmosphere in the interior region.

46. The method of claim 45, wherein the step of providing a second plurality of shims further comprises providing a second plurality of shims having an inorganic film over a first surface, second surface or both first and second surfaces thereof.

47. The method of claim 45, wherein the step of providing a first plurality of spacers further comprises:

irradiating the first glass substrate at a location with a focused laser beam, and terminating the irradiating to fix the spacer; and

repeating the step of irradiating a plurality of times for different locations to form the first plurality of spacers.

48. The method of claim 45, wherein the step of providing a first plurality of spacers and providing a second plurality of shims further comprise:

depositing a film of material on the first surface of the first glass substrate; and

patterning the deposited film by masking and etching.

49. The method of claim 46, wherein the composition of the film is selected from the group consisting of SnO₂, ZnO, TiO₂, ITO, Zn, Ti, Ce, Pb, Fe, Va, Cr, Mn, Mg, Ge, SnF₂, ZnF₂ and combinations thereof.

50. The method of claim 46, wherein the composition of the film is selected to lower the activation energy for inducing creep flow of the first substrate, the second substrate, or both the first and second substrates.

51. The method of claim 46, wherein the composition of the film is a laser absorbing low liquidus temperature material with a liquidus temperature less than or equal to about 1000°

C.

52. The method of claim 46, wherein the composition of the film comprises:

20-100 mol % SnO;

0-50 mol % SnF₂; and

0-30 mol % P₂O₅ or B₂O₃.

53. The method of claim 45, wherein the first substrate, the second substrate, the second plurality of shims or each of the first and second substrates and second plurality of shims includes impurities selected from the group consisting of As, Fe, Ga, K, Mn, Na, P, Sb, Ti, Zn, Sn and combinations thereof.

54. The method of claim 45, wherein the first and second substrates have different lateral dimensions, different CTEs, different thicknesses, or combinations thereof.

55. The method of claim 45, wherein the laser radiation comprises UV radiation at a predetermined wavelength between approximately 193 nm to approximately 420 nm.

56. The method of claim 45, wherein the laser radiation comprises NIR radiation at a predetermined wavelength between approximately 780 nm to approximately 5000 nm.

57. The method of claim 45, wherein the first, second or first and second substrates comprise an alkaline earth boro-aluminosilicate glass, alkali-aluminosilicate glass, soda-lime glass, boro-silicate glass, thermally strengthened glass, chemically strengthened glass, and combinations thereof.

58. The method of claim 45, wherein the step of laser sealing creates a weld characterized by

59. The method of claim 45, wherein the step of laser sealing creates a weld characterized by

60. A vacuum insulated window produced by the method of claim 45.

61. A method of forming a sealed device comprising the steps of:

providing a first substrate having a first surface;

providing a second substrate adjacent the first substrate; and

forming a weld between an interface of the first substrate and the adjacent second substrate,

wherein the weld is characterized by

62. A method of forming a sealed device comprising the steps of:

providing a first substrate having a first surface;

providing a second substrate adjacent the first substrate; and

forming a weld between an interface of the first substrate and the adjacent second substrate,

wherein the weld is characterized by