RESISTIVE COATING FOR VOLTAGE UNIFORMITY

• US 20170336693A1
• Filed: 05/22/2017
• Published: 11/23/2017
• Est. Priority Date: 05/20/2016
• Status: Active Grant

• Current Assignee: Gentex Corporation
• Original Assignee: Gentex Corporation
• Inventors: Stephenson, Michael T., Franz, Sue F., Luten, Henry A., Anderson, John S.
• Granted Patent: US 10,481,460 B2
• Time in Patent Office: Days
• CPC Class Codes: E06B 2009/2464 featuring transparency control by applying voltage, e.g. LCD, electrochromic panels
• CPC Class Codes: E06B 9/24 Screens or other constructions affording protection against light, especially against sunshine; Similar screens for privacy or appearance; Slat blindsoperating, guiding or securing devices or arrangements for roll-type closures E06B9/56; free-hanging flexible screens A47H23/00
• CPC Class Codes: G02F 1/15165 Polymers
• CPC Class Codes: G02F 1/153 Constructional details
• CPC Class Codes: G02F 1/1533 structural features not otherwise provided for
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 1/161 Gaskets; Spacers; Sealing of cells; Filling or closing of cells
• CPC Class Codes: G02F 1/163 Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
• CPC Class Codes: G02F 2001/1536 additional, e.g. protective, layer inside the cell

Abstract

An electrode for an electrochromic device includes a resistive layer disposed over a conductive layer. The resistive layer is disposed between the conductive layer and an electrochromic material in the electrochromic device. The electrode reduces non-uniform response of the electrochromic material when the electrochromic device is in operation.

Claims

1. An electrode assembly for an electrochromic device, comprising:

a substrate;

a conductive layer disposed over the substrate; and

a resistive layer disposed over the conductive layer,

wherein the substrate, the conductive layer, and the resistive layer is substantially transparent.

2. The electrode assembly of claim 1, further comprising an additional conductive layer disposed over the resistive layer, wherein the additional conductive layer is substantially transparent.

3. The electrode assembly of claim 1, wherein the conductive layer comprises indium tin oxide.

4. The electrode assembly of claim 1, wherein the resistive layer comprises oxidized titanium disilicide.

5. The electrode assembly of claim 1, wherein the resistive layer has a resistance of about 1,000 Ω

/square to about 10,000 Ω

/square.

6. The electrode assembly of claim 1, wherein the substrate comprises a glass material or a polymer material.

7. An electrochromic device, comprising:

a first substrate;

a first conductive layer disposed over the first substrate;

a first resistive layer disposed over the first conductive layer;

an electrochromic material;

a second substrate;

a second conductive layer disposed over the second substrate; and

a second resistive layer disposed over the second conductive layer,

wherein the first resistive layer is disposed between the first conductive layer and the electrochromic material, and the second resistive layer is disposed between the second conductive layer and the electrochromic material.

8. The electrochromic device of claim 7, further comprising at least one seal configured to prevent the electrochromic material from leaking out of the electrochromic device and/or configured to prevent atmospheric exposure of the electrochromic material.

9. The electrochromic device of claim 7, further comprising a first additional conductive layer disposed between the first resistive layer and the electrochromic material, and a second additional conductive layer disposed between the second resistive layer and the electrochromic material.

10. The electrochromic device of claim 7, wherein the electrochromic device has an electrochromic cell spacing of about 10 μ

m to about 750 μ

m.

11. The electrochromic device of claim 7, wherein the first resistive layer has a resistance of about 1,000 Ω

/square to about 10,000 Ω

/square, and the second resistive layer has a resistance of about 1,000 Ω

/square to about 10,000 Ω

/square.

12. The electrochromic device of claim 7, wherein the electrochromic device is a window or mirror.

13. A method of producing an electrode for an electrochromic device, comprising:

disposing a conductive layer over a substrate; and

disposing a resistive layer over the conductive layer,

wherein the substrate, conductive layer, and the resistive layer are substantially transparent.

14. The method of claim 13, further comprising disposing an additional conductive layer over the resistive layer, wherein the additional conductive layer is substantially transparent.

15. The method of claim 13, further comprising:

disposing a sacrificial material over a portion of the conductive layer before disposing the resistive layer over the conductive layer; and

removing the sacrificial material after the deposition of the resistive layer.

16. The method of claim 15, wherein removing the sacrificial material comprises a laser ablation process.

17. The method of claim 15, wherein sacrificial material comprises chromium.

18. The method of claim 13, wherein disposing the resistive layer comprises a sputtering deposition process or a wet chemical applied coating.

19. The method of claim 13, wherein disposing the conductive layer comprises a chemical vapor deposition or physical vapor deposition process.