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METHODS FOR USING REMOTE PLASMA CHEMICAL VAPOR DEPOSITION (RP-CVD) AND SPUTTERING DEPOSITION TO GROW LAYERS IN LIGHT EMITTING DEVICES

  • US 20170338369A1
  • Filed: 05/19/2017
  • Published: 11/23/2017
  • Est. Priority Date: 05/20/2016
  • Status: Active Grant
First Claim
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1. A method for growing a light emitting device, the method comprising:

  • growing a light emitting device structure on a growth substrate, the light emitting device structure including a n-type region, a light emitting region and a p-type region stacked together; and

    growing a tunnel junction on the light emitting device structure by using at least one of remote plasma chemical vapor deposition (RP-CVD) and sputtering deposition.

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