SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
First Claim
1. A semiconductor device comprising:
- a substrate having a surface;
a beam supported by the substrate;
a movable structural body supported by the beam so as to be displaceable in an in-plane direction and an out-of-plane direction with respect to the surface of the substrate;
a first stopper member supported by the substrate and arranged, with the movable structural body being in a stationary state, with a first gap from the movable structural body in the in-plane direction;
a second stopper member supported by the first stopper member and arranged, with the movable structural body being in a stationary state, with a second gap from the movable structural body in the out-of-plane direction; and
a third stopper member supported by the first stopper member, arranged opposite to the second stopper member with the movable structural body interposed therebetween in the out-of-plane direction, and arranged, with the movable structural body being in a stationary state, with a third gap from the movable structural body.
1 Assignment
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Accused Products
Abstract
A semiconductor device includes a substrate, a beam, a movable structural body, a first stopper member, a second stopper member and a third stopper member. The first stopper member is arranged with a first gap from the movable structural body in an in-plane direction. The second stopper member is arranged with a second gap from the movable structural body in an out-of-plane direction. The third stopper member is arranged opposite to the second stopper member with the movable structural body interposed therebetween in the out-of-plane direction, and is arranged with a third gap from the movable structural body. Consequently, there can be provided a semiconductor device in which excessive displacement of the movable structural body can be suppressed to thereby suppress damage to and breakage of the beam supporting the movable structural body, and a method of manufacturing the same.
6 Citations
5 Claims
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1. A semiconductor device comprising:
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a substrate having a surface; a beam supported by the substrate; a movable structural body supported by the beam so as to be displaceable in an in-plane direction and an out-of-plane direction with respect to the surface of the substrate; a first stopper member supported by the substrate and arranged, with the movable structural body being in a stationary state, with a first gap from the movable structural body in the in-plane direction; a second stopper member supported by the first stopper member and arranged, with the movable structural body being in a stationary state, with a second gap from the movable structural body in the out-of-plane direction; and a third stopper member supported by the first stopper member, arranged opposite to the second stopper member with the movable structural body interposed therebetween in the out-of-plane direction, and arranged, with the movable structural body being in a stationary state, with a third gap from the movable structural body. - View Dependent Claims (2, 3)
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4. A method of manufacturing a semiconductor device, comprising:
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forming a beam supported by a substrate having a surface, a movable structural body supported by the beam, a first stopper member supported by the substrate and arranged at a distance from the movable structural body in an in-plane direction with respect to the surface, a second stopper member supported by the first stopper member and arranged at a distance from the movable structural body in an out-of-plane direction with respect to the surface, a third stopper member supported by the first stopper member, arranged opposite to the second stopper member with the movable structural body interposed therebetween in the out-of-plane direction, and arranged at a distance from the movable structural body, a first sacrificial film formed between the movable structural body and the first stopper member, a second sacrificial film formed between the movable structural body and the second stopper member, and a third sacrificial film formed between the movable structural body and the third stopper member; and performing an etching process to remove the first sacrificial film, the second sacrificial film and the third sacrificial film, to form a first gap between the movable structural body and the first stopper member, form a second gap between the movable structural body and the second stopper member, and form a third gap between the movable structural body and the third stopper member. - View Dependent Claims (5)
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Specification