SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE
First Claim
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1. A reticle design method, comprising:
- preparing an OPC (Optical Proximity Correction) model which simulates a pattern image;
inputting at least one tool parameter of an exposure apparatus into the OPC model;
inputting reticle design data, which represents a design of a layout to be imaged, into the OPC model which inputted the tool parameter;
predicting a result by using the OPC model after inputting the reticle design data into the OPC model;
exposing a pattern including the layout;
comparing an exposure result and the predicted result; and
determining whether the prediction made on the basis of the OPC model vs. the exposure result is less than a predetermined criteria (ε
2).
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Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.
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Citations
8 Claims
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1. A reticle design method, comprising:
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preparing an OPC (Optical Proximity Correction) model which simulates a pattern image; inputting at least one tool parameter of an exposure apparatus into the OPC model; inputting reticle design data, which represents a design of a layout to be imaged, into the OPC model which inputted the tool parameter; predicting a result by using the OPC model after inputting the reticle design data into the OPC model; exposing a pattern including the layout; comparing an exposure result and the predicted result; and determining whether the prediction made on the basis of the OPC model vs. the exposure result is less than a predetermined criteria (ε
2). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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Specification