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SCANNER BASED OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD OF USE

  • US 20170363951A1
  • Filed: 08/30/2017
  • Published: 12/21/2017
  • Est. Priority Date: 01/18/2007
  • Status: Active Grant
First Claim
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1. A reticle design method, comprising:

  • preparing an OPC (Optical Proximity Correction) model which simulates a pattern image;

    inputting at least one tool parameter of an exposure apparatus into the OPC model;

    inputting reticle design data, which represents a design of a layout to be imaged, into the OPC model which inputted the tool parameter;

    predicting a result by using the OPC model after inputting the reticle design data into the OPC model;

    exposing a pattern including the layout;

    comparing an exposure result and the predicted result; and

    determining whether the prediction made on the basis of the OPC model vs. the exposure result is less than a predetermined criteria (ε

    2).

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