×

WAFER PROCESSING EQUIPMENT HAVING CAPACITIVE MICRO SENSORS

  • US 20170365531A1
  • Filed: 06/20/2016
  • Published: 12/21/2017
  • Est. Priority Date: 06/20/2016
  • Status: Active Grant
First Claim
Patent Images

1. A particle monitoring device, comprising:

  • a wafer substrate including wafer electronics and a support surface;

    a capacitive micro sensor mounted on the support surface at a location, wherein a capacitance of the capacitive micro sensor changes when a material is deposited on or removed from the capacitive micro sensor; and

    a barrier layer between the capacitive micro sensor and the wafer substrate, wherein the capacitive micro sensor is electrically connected to the wafer electronics through the barrier layer, and wherein the capacitive micro sensor is strippable by a plasma and the barrier layer is not strippable by the plasma.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×