ELECTRO-OPTIC ELEMENT WITH IMI LAYER

• US 20180017823A1
• Filed: 07/14/2017
• Published: 01/18/2018
• Est. Priority Date: 07/15/2016
• Status: Active Grant

• Current Assignee: Gentex Corporation
• Original Assignee: Gentex Corporation
• Inventors: Saenger Nayver, Mario F., Neuman, George A., Anderson, John S.
• Granted Patent: US 10,444,575 B2
• Time in Patent Office: Days
• CPC Class Codes: B60K 2360/27 using semi-transparent optical elements
• CPC Class Codes: B60K 2360/334 Projection means
• CPC Class Codes: B60K 35/00 Instruments specially adapted for vehicles; Arrangement of instruments in or on vehicles
• CPC Class Codes: B60K 35/23 Head-up displays [HUD] optical aspects of head-up displays G02B27/01
• CPC Class Codes: B60K 35/415 Glare prevention
• CPC Class Codes: B60R 1/088 using a cell of electrically changeable optical characteristic, e.g. liquid-crystal or electrochromic mirrors
• CPC Class Codes: C03C 17/3657 the multilayer coating having optical properties
• CPC Class Codes: C03C 17/3668 the multilayer coating having electrical properties
• CPC Class Codes: C03C 2217/94 Transparent conductive oxide layers [TCO] being part of a multilayer coating
• CPC Class Codes: C09K 2211/187 of the iron group metals, i.e. Fe, Co or Ni
• CPC Class Codes: G02F 1/13439 characterised by their electrical, optical, physical properties; materials therefor; method of making
• CPC Class Codes: G02F 1/1362 Active matrix addressed cells G02F1/134336, G02F1/134363 take precedence
• CPC Class Codes: G02F 1/155 Electrodes
• CPC Class Codes: G02F 1/157 Structural association of cells with optical devices, e.g. reflectors or illuminating devices
• CPC Class Codes: G02F 1/163 Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
• CPC Class Codes: G02F 2001/1552 Inner electrode, e.g. the electrochromic layer being sandwiched between the inner electrode and the support substrate
• CPC Class Codes: G09G 3/19 using electrochromic devices
• CPC Class Codes: G09G 3/38 using electrochromic devices

Abstract

An electro-optic assembly includes a first partially reflective, partially transmissive substrate defining a first surface and a second surface. A second partially reflective, partially transmissive substrate defines a third surface and a fourth surface. A space is defined between a first substrate and a second substrate. A seal is disposed about a perimeter of the first and second substrates. An electro-optic material is disposed between the second surface of the first substrate and the third surface of the second substrate. The electro-optic assembly is operable to change at least one of a reflectance state and a transmittance state in either a discrete or continuous manner. A transparent electrode coating is disposed between the second surface and the third surface. The transparent electrode coating includes an insulator layer, metal layer, and insulator layer (IMI) structure. The reflectance off of the transparent electrode coating is less than about 2%.

Claims

1. An electro-optic assembly, comprising:

a first partially reflective, partially transmissive substrate defining a first surface and a second surface;

a second partially reflective, partially transmissive substrate defining a third surface and a fourth surface;

a space defined between a first substrate and a second substrate;

a seal disposed about a perimeter of the first and second substrates;

an electro-optic material disposed on at least one of the second surface of the first substrate and the third surface of the second substrate, wherein said electro-optic assembly is operable to change at least one of a reflectance state and a transmittance state in either a discrete or continuous manner; and

a transparent electrode coating disposed between the second surface and the third surface, the transparent electrode coating including an insulator layer, a metal layer, an insulator layer (IMI) structure, wherein a reflectance off of the transparent electrode coating is less than about 2%.

2. The electro-optic assembly of claim 1, wherein the electro-optic material is an electrochromic material.

3. The electro-optic assembly of claim 1, wherein the electro-optic material is a liquid crystal.

4. The electro-optic assembly of claim 1, wherein a “

k”

value of the insulator layer of the IMI structure is less than about 0.05.

5. The electro-optic assembly of claim 1, wherein a sheet resistance of the IMI structure is less than about 10 ohms/sq.

6. The electro-optic assembly of claim 1, wherein the reflectance is at least one of CIE Y, average reflectance, and weighted reflectance.

7. The electro-optic assembly of claim 1, wherein said electro-optic assembly includes an absorption of less than 10%.

8. The electro-optic assembly of claim 7, wherein the transmittance of said transparent electrode is greater than 95%.

9. The electro-optic assembly of claim 1, wherein the IMI structure further includes a ZnO layer below the metal layer of the IMI structure.

10. The electro-optic assembly of claim 1, wherein the reflectance of the transparent electrode is less than about 0.25%.

11. The electro-optic assembly of claim 1, further comprising:

a switchable mirror assembly.

12. An electro-optic assembly, comprising:

a first partially reflective, partially transmissive substrate defining a first surface and a second surface;

a second partially reflective, partially transmissive substrate defining a third surface and a fourth surface;

an electro-optic material disposed between the second surface of a first substrate and the third surface of a second substrate; and

a transparent electrode coating disposed on at least one of the second surface and the third surface, the transparent electrode coating including an insulator layer, a metal layer, an insulator layer (IMI) structure, wherein a reflectance off of the transparent electrode coating is less than about 2%.

13. The electro-optic assembly of claim 12, wherein the reflectance of the transparent electrode is less than about 0.25%.

14. The electro-optic assembly of claim 12, wherein an approximate thickness of the metal layer of the IMI structure equals −

17.4 nm+11.44*refractive index of the insulator layer.

15. The electro-optic assembly of claim 12, wherein an optical thickness of the insulator layers is between about ⅛

to ⅕

of a full wave.

16. The electro-optic assembly of claim 12, wherein the electro-optic material is an electrochromic material that changes the transmittance of the electro-optic assembly in a continuous manner, and wherein the reflectance is essentially constant with changes to the transmittance.

17. An electro-optic assembly for a heads up display system, comprising:

a first substrate defining a first surface and a second surface;

a second substrate defining a third surface and a fourth surface;

a space defined between the first substrate and the second substrate;

an electro-optic material disposed between the second surface of the first substrate and the third surface of the second substrate, wherein said electro-optic assembly is operable to change the transmittance state in either a discrete or continuous manner; and

a transparent electrode coating disposed on at least one of the second surface and the third surface, the transparent electrode coating including an insulator layer, a metal layer, an insulator layer (IMI) structure, wherein a transmittance of the IMI structure is greater than 80% and the reflectance is less than about 1%.

18. The electro-optic assembly of claim 17, wherein the electro-optic material is an electrochromic material.

19. The electro-optic assembly of claim 17, wherein the electro-optic material is a liquid crystal.

20. The electro-optic assembly of claim 17, wherein the reflectance is essentially constant with changes to the transmittance of the electro-optic assembly.

21. A variable transmittance electro-optic assembly, comprising:

a first partially reflective, partially transmissive substrate defining a first surface and a second surface;

a second partially reflective, partially transmissive substrate defining a third surface and a fourth surface, wherein the first substrate and the second substrate are configured to be held in a parallel spaced apart relationship and sealed about a perimeter of the first and second substrates;

an electro-optic material disposed between the second surface and the third surface;

a principle fixed transflector including a transflector coating disposed on at least one of the first and second surfaces; and

a low reflectance transparent electrode IMI coating disposed on secondary surfaces of said variable transmittance electro-optic assembly, and configured for p polarized light such that the electro-optic assembly has a low double image characteristic defined by a ratio of the reflectance of the transflector coating to a net reflectance of at least one of the secondary surfaces, and wherein the ratio is greater than