×

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS

  • US 20180019113A1
  • Filed: 09/25/2017
  • Published: 01/18/2018
  • Est. Priority Date: 09/29/2008
  • Status: Active Grant
First Claim
Patent Images

1. A mask pattern forming method comprising steps of:

  • loading a substrate which has a thin film and a patterned film on the thin film, into a process chamber, the patterned film having a line and a space therein;

    slimming the patterned film in the process chamber andforming an oxide film on the patterned film and the thin film in the process chamber by performing a cycle of adsorbing a source gas on the thin film and the patterned film and oxidizing the source gas on the thin film and the patterned film a predetermined number of times such that the deposited oxide film has a predetermined thickness,wherein the steps of slimming the patterned film and forming the oxide film are performed in the same process chamber.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×