EMBEDDED SACRIFICIAL LAYER TO ENHANCE BIOSENSOR STABILITY AND LIFETIME FOR NANOPATTERNED ELECTRODES

• US 20180020957A1
• Filed: 07/25/2016
• Published: 01/25/2018
• Est. Priority Date: 07/25/2016
• Status: Active Grant

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Kinser, Emily R.
• Granted Patent: US 10,376,193 B2
• Time in Patent Office: Days
• CPC Class Codes: A61B 2562/0209 Special features of electrodes classified in A61B5/24, A61B5/25, A61B5/283, A61B5/291, A61B5/296, A61B5/053
• CPC Class Codes: A61B 2562/125 characterised by the manufacture of electrodes
• CPC Class Codes: A61B 5/14532 for measuring glucose, e.g. by tissue impedance measurement
• CPC Class Codes: A61B 5/1486 using enzyme electrodes, e.g. with immobilised oxidase

Abstract

An electrode structure is provided that includes an electrode base having topography located on a surface of the electrode base structure. A biological functionalization layer is located on one or more exposed surfaces of at least the topography of the electrode. A sacrificial layer is located on the biological functionalization layer and is present at least in the physical space located between the individual features of the topography of the electrode.

Claims

1. A structure comprising:

an electrode containing an electrode base having topography located on a surface of an electrode base structure;

a biological functionalization layer located on one or more exposed surfaces of at least said topography of said electrode; and

a sacrificial layer located on said biological functionalization layer and present in the physical space located between said individual features of topography of said electrode.

2. The structure of claim 1, wherein said topography is non-random.

3. The structure of claim 2, wherein said electrode base structure and said non-random topography are of uniform construction and uniform composition.

4. The structure of claim 3, wherein said uniform composition of said electrode base structure and said non-random topography comprise a conductive material.

5. The structure of claim 4, wherein said conductive material is amorphous.

6. The structure of claim 4, wherein said conductive material comprises a metallic glass, wherein said metallic glass includes an element selected from the group consisting of platinum, copper, nickel, phosphorous, palladium, zirconium, silver, aluminum, carbon and an alloy of one or more of said elements.

7. The structure of claim 2, wherein said non-random topography comprises repeating individually articulated features.

8. The structure of claim 7, wherein each repeating individually articulated feature comprises rods, cones, or annular structures.

9. The structure of claim 1, wherein said biological functionalization layer is composed of an oligonucleotide, a nucleic acid, a peptide, a ligand, a protein, an enzyme, or any other material apt to bind with a complementary target biomolecule.

10. The structure of claim 9, wherein said biological functionalization layer is composed of glucose oxidase or glucose dehydrogenase.

11. The structure of claim 1, wherein said sacrificial layer is composed of a biodegradable material.

12. The structure of claim 11, wherein said biodegradable material is selected from the group consisting of a polymer, a metal, a ceramic or nanoparticles.

13. The structure of claim 1, wherein a portion of said biological functionalization material is present on an exposed surface of said electrode base structure.

14. A method of forming a structure, said method comprising:

providing an electrode having topography located on a surface of an electrode base structure;

attaching a biological functionalization material to one or more exposed surfaces of at least said topography of said electrode; and

forming a sacrificial layer on said biological functionalization layer and within gaps located between said topography of said electrode.

15. The method of claim 14, wherein said topography is non-random.

16. The method of claim 15, wherein said electrode base structure and said non-random topography are of uniform construction and uniform composition.

17. The method of claim 14, wherein said forming said sacrificial layer comprises:

depositing a biodegradable material; and

performing a recess etch.

18. The method of claim 15, wherein said non-random topography comprises repeating individually articulated features.

19. The method of claim 18, wherein each repeating individually articulated feature comprises rods, cones, or annular structures.

20. The method of claim 14, wherein said sacrificial layer is composed of a biodegradable material.