Electronically Compensated Radome Using Frequency Selective Surface Compensation

• US 20180053994A1
• Filed: 08/22/2016
• Published: 02/22/2018
• Est. Priority Date: 08/22/2016
• Status: Abandoned Application

• Current Assignee: L-3 Communications Corporation (L3Harris Technologies, Inc.)
• Original Assignee: L-3 Communications Corporation (L3Harris Technologies, Inc.)
• Inventors: GRANDO, Maurio Batista, HUTCHESON, George Zohn
• Application Number:
  US15/242,983
• Publication Number:
  US 20180053994A1
• Time in Patent Office: Days
• CPC Class Codes: H01Q 1/281 Nose antennas
• CPC Class Codes: H01Q 1/425 comprising a metallic grid
• CPC Class Codes: H01Q 1/48 Earthing means; Earth screens; Counterpoises
• CPC Class Codes: H01Q 15/002 said selective devices being reconfigurable or tunable, e.g. using switches or diodes

Abstract

An apparatus for compensating for distortions in RF beams caused by a radome. The apparatus comprises: i) a plurality of metal patches arranged in rows and columns; ii) a first plurality of varactors coupling adjoining ones of a first plurality of metal patches in a first row of metal patches; and iii) a first reference voltage source configured to apply a first reference voltage to the first plurality of metal patches in the first row. The apparatus further comprises: iv) a second plurality of varactors coupling adjoining ones of a second plurality of metal patches in a first column of metal patches; and v) a second reference voltage source configured to apply a second reference voltage to the second plurality of metal patches in the first column. The first and second reference voltage sources adjust the phase delays of RF beams passing through each metal patch in the rows and columns.

Claims

1. For use in a radome, an apparatus for compensating for distortions in radio frequency (RF) beams caused by the radome, the apparatus comprising:

a plurality of metal patches arranged in rows and columns;

a first plurality of varactors coupling adjoining ones of a first plurality of metal patches in a first row of metal patches; and

a first reference voltage source configured to apply a first reference voltage to the first plurality of metal patches in the first row,

wherein the first reference voltage source adjusts the phase delay of a portion of an RF beam passing through each of the first plurality of metal patches in the first row by controlling a voltage or a current at each varactor to thereby generate electrical phase delays between the adjoining ones of the first plurality of metal patches in the first row.

2. The apparatus as set forth in claim 1, further comprising a first row fine phase step controller configured to couple a first one of the first plurality of metal patches in the first row to the first reference voltage source.

3. The apparatus as set forth in claim 2, wherein the first row fine phase step controller comprises a variable resistor.

4. The apparatus as set forth in claim 2, further comprising a second row fine phase step controller configured to couple a second one of the first plurality of metal patches in the first row to a ground.

5. The apparatus as set forth in claim 4, wherein the second row fine phase step controller comprises a variable resistor.

6. The apparatus as set forth in claim 1, wherein further comprising:

a second plurality of varactors coupling adjoining ones of a second plurality of metal patches in a first column of metal patches; and

a second reference voltage source configured to apply a second reference voltage to the second plurality of metal patches in the first column,

wherein the second reference voltage source adjusts the phase delay of a portion of an RF beam passing through each of the second plurality of metal patches in the first column by controlling a voltage or a current at each varactor to thereby generate electrical phase delays between the adjoining ones of the second plurality of metal patches in the first column.

7. The apparatus as set forth in claim 6, further comprising a first column fine phase step controller configured to couple a first one of the second plurality of metal patches in the first column to the second reference voltage source.

8. The apparatus as set forth in claim 7, wherein the first column fine phase step controller comprises a variable resistor.

9. The apparatus as set forth in claim 7, further comprising a second column fine phase step controller configured to couple a second one of the second plurality of metal patches in the first column to a ground.

10. The apparatus as set forth in claim 9, wherein the second column fine phase step controller comprises a variable resistor.