Force Sensing in an Electronic Device Using a Single Layer of Strain-Sensitive Structures
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Abstract
A strain-sensitive structure includes two resistive structures connected in series and formed on one surface of a substrate. One resistive structure is formed with a first trace arranged in first trace pattern. The other resistive structure is formed with a second trace arranged in a second trace pattern. The first resistive structure is configured to experience strain in response to an applied stress on the substrate. The second resistive structure is configured to experience less strain in response to the applied stress on the substrate compared to the first resistive structure. Together the strain-sensitive structure and the substrate form a force sensing layer that can be included in an electronic device.
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Citations
42 Claims
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1-19. -19. (canceled)
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20. An electronic device, comprising:
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a display layer positioned below a cover layer; a force sensing layer positioned adjacent the display layer, the force sensing layer comprising; a substrate; and a plurality of strain-sensitive structures formed on a surface of the substrate; a processing device operably connected to the plurality of strain-sensitive structures and configured to; receive a strain signal from each strain-sensitive structure; and correlate at least one strain signal into an amount of force applied to the cover layer, wherein each strain-sensitive structure in the plurality of strain-sensitive structures comprises; a first trace arranged in a first trace pattern on the surface of the substrate and forming a first resistive structure; a second trace arranged in a second trace pattern on the surface of the substrate and forming a second resistive structure, the second resistive structure connected in series with the first resistive structure, wherein the first trace pattern of the first resistive structure is sensitive to strain in one or more directions in response to an applied stress on the substrate, and the second trace pattern of the second resistive structure is less sensitive to strain than the first trace pattern of the first resistive structure, in the one or more directions, in response to the applied stress on the substrate. - View Dependent Claims (21, 22, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42)
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23-25. -25. (canceled)
Specification