PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND METHOD OF CONTROLLING PLASMA GENERATING APPARATUS
First Claim
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1. A plasma generating apparatus comprising:
- a high frequency power supply that generates a high frequency power;
a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed;
a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and
a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter.
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Abstract
A plasma generating apparatus according to the present disclosure includes: a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter.
3 Citations
8 Claims
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1. A plasma generating apparatus comprising:
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a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A plasma processing apparatus comprising:
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a processing chamber; a placing unit provided inside the processing chamber and configured to place a substrate on an upper surface thereof; a processing gas supply unit provided above the placing unit and configured to supply a processing gas to the upper surface of the placing unit; and a plasma generating apparatus that activates the processing gas supplied by the processing gas supply unit, wherein the plasma generating apparatus includes; a high frequency power supply that generates a high frequency power; a plasma generation electrode connected to the high frequency power supply and formed by a hollow tube in which cooling water is distributed; a conductivity meter that measures conductivity of the cooling water inside the plasma generation electrode; and a controller that controls output of the high frequency power supply based on the conductivity of the cooling water measured by the conductivity meter.
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8. A method of controlling a plasma generating apparatus which generates plasma by supplying a high frequency power to a plasma generation electrode formed by a hollow tube in which cooling water is distributed, the method comprising:
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measuring conductivity of the cooling water inside the plasma generation electrode; and controlling the high frequency power based on the measured conductivity of the cooling water.
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Specification