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FACILITATION OF SPIN-COAT PLANARIZATION OVER FEATURE TOPOGRAPHY DURING SUBSTRATE FABRICATION

  • US 20180096905A1
  • Filed: 10/04/2017
  • Published: 04/05/2018
  • Est. Priority Date: 10/04/2016
  • Status: Active Grant
First Claim
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1. A method of facilitating spin-coat planarization over feature topography during substrate fabrication, the method comprising:

  • generating a topography map of features of a patterned substrate, the generating the topography map is based, at least in part, on a substrate patterning information;

    generating a film-thickness model of a substrate after a spin-on coating is applied to the patterned substrate, wherein the model generation is based, at least in part, on the topography map and on a thickness of a film being deposited on the patterned substrate;

    determining film thickness of an area of the film-thickness model falls with a defined range;

    based upon that determining, declaring that area of the film-thickness model to be planar;

    otherwise, generating suggested remedies to enhance planarization of that area of the film-thickness model, wherein the remedies affect the substrate fabrication.

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