METHOD OF MANUFACTURING POLISHING PAD
First Claim
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1. A method of manufacturing a polishing pad, the method comprising:
- producing an urethane prepolymer having a viscosity of 20,000 cps (at 25°
C.) to 40,000 cps (at 25°
C.) by mixing a plurality of polymers;
mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60°
C. to 150°
C.; and
manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.
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Abstract
A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25° C.) to 40,000 cps (at 25° C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60° C. to 150° C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.
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Citations
6 Claims
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1. A method of manufacturing a polishing pad, the method comprising:
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producing an urethane prepolymer having a viscosity of 20,000 cps (at 25°
C.) to 40,000 cps (at 25°
C.) by mixing a plurality of polymers;mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60°
C. to 150°
C.; andmanufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast. - View Dependent Claims (2, 3, 4, 5, 6)
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Specification