×

METHOD OF MANUFACTURING POLISHING PAD

  • US 20180118908A1
  • Filed: 04/06/2016
  • Published: 05/03/2018
  • Est. Priority Date: 04/06/2016
  • Status: Active Grant
First Claim
Patent Images

1. A method of manufacturing a polishing pad, the method comprising:

  • producing an urethane prepolymer having a viscosity of 20,000 cps (at 25°

    C.) to 40,000 cps (at 25°

    C.) by mixing a plurality of polymers;

    mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60°

    C. to 150°

    C.; and

    manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×