Method and Apparatus To Reduce The Leakage Rate of a Hermetic Cavity
First Claim
1. A chip scale vapor cell comprising:
- a first substrate;
a second substrate bonded to the first substrate with a bonding material, the second substrate comprising an upper surface and a lower surface;
a primary hermetic cavity comprising a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate;
a secondary hermetic cavity comprising a second bottom wall and second sidewalls formed in the first substrate, a second top wall formed by the lower surface of the second substrate, the secondary hermetic cavity being separate from the primary hermetic cavity and surrounding a perimeter of the primary hermetic cavity; and
a gas sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.
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Accused Products
Abstract
A chip scale vapor cell and millimeter wave atomic clock apparatus are disclosed. The chip scale vapor cell includes a first substrate and a second substrate bonded to the first substrate with a bonding material. A primary hermetic cavity includes a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate. A secondary hermetic cavity includes a second bottom wall and second sidewalls formed in the first substrate and a second top wall formed by the lower surface of the second substrate. The secondary hermetic cavity is separate from the primary hermetic cavity and surrounds the perimeter of the primary hermetic cavity. A gas, which can be a dipolar molecular gas, is sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure.
18 Citations
19 Claims
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1. A chip scale vapor cell comprising:
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a first substrate; a second substrate bonded to the first substrate with a bonding material, the second substrate comprising an upper surface and a lower surface; a primary hermetic cavity comprising a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate; a secondary hermetic cavity comprising a second bottom wall and second sidewalls formed in the first substrate, a second top wall formed by the lower surface of the second substrate, the secondary hermetic cavity being separate from the primary hermetic cavity and surrounding a perimeter of the primary hermetic cavity; and a gas sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A millimeter wave atomic clock apparatus comprising:
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a vapor cell, comprising; a first substrate, a second substrate bonded to the first substrate with a bonding material, the second substrate comprising an upper surface and a lower surface, a primary hermetic cavity comprising a first bottom wall and first sidewalls formed in the first substrate and a first top wall formed by the lower surface of the second substrate, a secondary hermetic cavity comprising a second bottom wall and second sidewalls formed in the first substrate, a second top wall formed by the lower surface of the second substrate, the secondary hermetic cavity being separate from the primary hermetic cavity, the secondary hermetic cavity surrounding a perimeter of the primary hermetic cavity and a dipolar molecular gas sealed in the primary hermetic cavity and the secondary hermetic cavity at a given initial pressure; and a transceiver circuit mounted to the second substrate and electrically coupled to provide an alternating electrical output signal at a first end of the primary hermetic cavity and to receive an alternating electrical input signal at a second end of the primary hermetic cavity, the transceiver circuit coupled to selectively adjust a frequency of the alternating electrical output signal and to provide a reference clock signal. - View Dependent Claims (14, 15, 16, 17, 18, 19)
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Specification