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ETCHING COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE BY USING THE SAME

  • US 20180163130A1
  • Filed: 11/06/2017
  • Published: 06/14/2018
  • Est. Priority Date: 12/14/2016
  • Status: Active Grant
First Claim
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1. An etching composition comprising:

  • a peracetic acid mixture;

    a fluorine compound;

    an acetate series organic solvent; and

    water.

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