BLANKING DEFLECTOR, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

• US 20180166248A1
• Filed: 11/16/2017
• Published: 06/14/2018
• Est. Priority Date: 12/08/2016
• Status: Active Grant

• Current Assignee: NuFlare Technology, Inc. (Toshiba Corporation)
• Original Assignee: NuFlare Technology, Inc. (Toshiba Corporation)
• Inventors: OGASAWARA, Munehiro
• Granted Patent: US 10,784,073 B2
• Time in Patent Office: Days
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: H01J 2237/0435 Multi-aperture
• CPC Class Codes: H01J 2237/0437 Semiconductor substrate
• CPC Class Codes: H01J 2237/31766 Continuous moving of wafer
• CPC Class Codes: H01J 37/045 Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
• CPC Class Codes: H01J 37/147 Arrangements for directing or deflecting the discharge along a desired path H01J37/045 take precedence; lenses H01J37/10
• CPC Class Codes: H01J 37/1472 Deflecting along given lines
• CPC Class Codes: H01J 37/304 Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

A blanking deflector includes a first electrode being plate-like, a second electrode electrically separated from the first electrode, and arranged such that a first space is formed between the first and second electrodes, and a third electrode electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first and third electrodes, wherein a transmission line, in which the second and third electrodes are electrically connected at, at least, input and output sides, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected.

Claims

1. A blanking deflector comprising:

a first electrode formed to be plate-like;

a second electrode configured to be electrically separated from the first electrode, and arranged such that a first space is formed between the first electrode and the second electrode; and

a third electrode configured to be electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first electrode and the third electrode, wherein

a transmission line, in which the second and third electrodes are electrically connected at, at least, an input side and an output side, is formed by the first, second, and third electrodes,

multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and

the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected.

2. The deflector according to claim 1, wherein

a coaxial cable having a characteristic impedance substantially same as a characteristic impedance of the transmission line is connected to an input side of the transmission line so as to apply the voltage signal from the coaxial cable, and

a terminating resistance having a characteristic impedance substantially same as the characteristic impedance of the transmission line is connected to an output side of the transmission line.

3. The deflector according to claim 1, wherein each of the first, second, and third electrodes is formed of a plate-like member extending in a zigzag manner.

4. The deflector according to claim 1, wherein the second space between the first and third electrodes changes depending on a beam diameter of a whole of the multi-beams.

5. The deflector according to claim 1, further comprising:

a resistor configured to connect the first and third electrodes at a region deviated from a beam passage region through which the multi-beams passes, in a region of the second space between the first and third electrodes.

6. The deflector according to claim 1, wherein

each of the first and third electrodes includes an insulating substrate and a conductive film formed on the insulating substrate, and

the second electrode itself is formed of conductive material.

7. A multi charged particle beams writing apparatus comprising:

an emission source configured to emit a charged particle beam;

a shaping aperture array substrate, in which a plurality of first openings are formed, configured to form multi-beams by making a region including a whole of the plurality of first openings irradiated with the charged particle beam, and making portions of the charged particle beam individually pass through a corresponding one of the plurality of first openings;

a blanking deflector including

a first electrode formed to be plate-like,

a second electrode configured to be electrically separated from the first electrode, and arranged such that a first space is formed between the first electrode and the second electrode, and

a third electrode configured to be electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first electrode and the third electrode, wherein

a transmission line, in which the second and third electrodes are electrically connected at, at least, an input side and an output side, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected;

a limiting aperture substrate configured to collectively block a whole of the multi-beams having been deflected to be in a beam-OFF condition by the blanking control; and

a stage configured to mount thereon a target object to be written with the multi-beams having passed through the limiting aperture substrate while being in a beam-ON condition controlled by the blanking control, wherein

the blanking deflector provides deflection such that an extension of a trajectory of an electron of the multi-beams passing a center of the shaping aperture array substrate and having been deflected intersects the center of the shaping aperture array substrate.

8. The apparatus according to claim 7, wherein a through-hole is formed in the first electrode, further comprising:

a coaxial cable configured to include an outer conductor connected to the first electrode near the through-hole of the first electrode, and a central conductor passing through the through-hole to be connected to an input side terminal of the second electrode.

9. A multi charged particle beams writing apparatus comprising:

an emission source configured to emit a charged particle beam;

a shaping aperture array substrate, in which a plurality of first openings are formed, configured to form multi-beams by making a region including a whole of the plurality of first openings irradiated with the charged particle beam, and making portions of the charged particle beam individually pass through a corresponding one of the plurality of first openings;

a blanking deflector including

a first electrode formed to be plate-like,

a second electrode configured to be electrically separated from the first electrode, and arranged such that a first space is formed between the first electrode and the second electrode, and

a third electrode configured to be electrically separated from the first electrode, and arranged such that a second space, sufficiently wider than the first space, is formed between the first electrode and the third electrode, wherein

a transmission line, in which the second and third electrodes are electrically connected at, at least, an input side and an output side, is formed by the first, second, and third electrodes, multi-beams of a charged particle beam are made to pass through the second space between the first and third electrodes, and the multi-beams are deflected for blanking control by a voltage signal applied from the input side to between the first electrode, and a connected group of the second and third electrodes electrically connected;

a limiting aperture substrate configured to collectively block a whole of the multi-beams having been deflected to be in a beam-OFF condition by the blanking control; and

a stage configured to mount thereon a target object to be written with the multi-beams having passed through the limiting aperture substrate while being in a beam-ON condition controlled by the blanking control, wherein

the second space between the first and third electrodes changes depending on a beam diameter of a whole of the multi-beams.

10. The apparatus according to claim 9, wherein a through-hole is formed in the first electrode, further comprising:

a coaxial cable configured to include an outer conductor connected to the first electrode near the through-hole of the first electrode, and a central conductor passing through the through-hole to be connected to an input side terminal of the second electrode.