SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
First Claim
1. A method for manufacturing semiconductor structure, comprising:
- (a) adhering a first carrier to a first surface of a wafer by a first temporary bonding layer;
(b) etching a second surface of the wafer facing away from the first carrier to form at least one through hole and at least one trench, wherein a conductive pad of the wafer is exposed through the through hole;
(c) forming an isolation layer on the second surface of the wafer, a sidewall of the through hole, and a sidewall of the trench;
(d) adhering a second carrier to the second surface of the wafer by a second temporary bonding layer, wherein the through hole and the trench are covered by the second carrier; and
(e) removing the first carrier and the first temporary bonding layer.
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Accused Products
Abstract
A method for manufacturing a semiconductor structure includes the following steps. A first carrier is adhered to a first surface of a wafer by a first temporary bonding layer. A second surface of the wafer facing away from the first carrier is etched to form at least one through hole and at least one trench, in which a conductive pad of the wafer is exposed through the through hole. An isolation layer is formed on the second surface of the wafer, a sidewall of the through hole, and a sidewall of the trench. A second carrier is adhered to the second surface of the wafer by a second temporary bonding layer, and thus the through hole and the trench are covered by the second carrier. The first carrier and the first temporary bonding layer are removed.
27 Citations
23 Claims
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1. A method for manufacturing semiconductor structure, comprising:
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(a) adhering a first carrier to a first surface of a wafer by a first temporary bonding layer; (b) etching a second surface of the wafer facing away from the first carrier to form at least one through hole and at least one trench, wherein a conductive pad of the wafer is exposed through the through hole; (c) forming an isolation layer on the second surface of the wafer, a sidewall of the through hole, and a sidewall of the trench; (d) adhering a second carrier to the second surface of the wafer by a second temporary bonding layer, wherein the through hole and the trench are covered by the second carrier; and (e) removing the first carrier and the first temporary bonding layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A semiconductor structure, comprising:
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a first chip having a surface that has a first conductive pad and a first image sensing area; a first dam element covering the first conductive pad and surrounding the first image sensing area; and an optical element disposed on the first dam element and covering the first image sensing area, wherein the optical element has a top surface and a bottom surface, the bottom surface facing the first image sensing area, the top surface facing away from the first image sensing area, and the top surface has curved shape. - View Dependent Claims (20, 21, 22, 23)
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Specification