ORIENTED ALUMINA SUBSTRATE FOR EPITAXIAL GROWTH
First Claim
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1. An oriented alumina substrate for epitaxial growth, comprising:
- crystalline grains constituting a surface thereof,the crystalline grains having a tilt angle of 1°
or more and 3°
or less and an average sintered grain size of 20 μ
m or more.
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Abstract
An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 1° or more and 3° or less and an average sintered grain size of 20 μm or more.
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Citations
4 Claims
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1. An oriented alumina substrate for epitaxial growth, comprising:
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crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 1°
or more and 3°
or less and an average sintered grain size of 20 μ
m or more. - View Dependent Claims (2, 3, 4)
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Specification