PATTERNING OF HIGH REFRACTIVE INDEX GLASSES BY PLASMA ETCHING
First Claim
1. A method for forming one or more diffractive gratings in a waveguide, the method comprising:
- providing a waveguide having a refractive index of greater than or equal to about 1.65, wherein more than 50 wt % of the waveguide is formed of one or more of B2O3, Al2O3, ZrO2, Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, ZnO, La2O3, Nb2O5, TiO2, HfO, and Sb2O3;
providing a mask layer over the waveguide, the mask layer having a pattern corresponding to the one or more diffractive gratings, the pattern selectively exposing portions of the waveguide; and
anisotropically etching the exposed portions of the waveguide to define the one or more diffractive gratings in the waveguide.
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Accused Products
Abstract
Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.
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Citations
29 Claims
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1. A method for forming one or more diffractive gratings in a waveguide, the method comprising:
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providing a waveguide having a refractive index of greater than or equal to about 1.65, wherein more than 50 wt % of the waveguide is formed of one or more of B2O3, Al2O3, ZrO2, Li2O, Na2O, K2O, MgO, CaO, SrO, BaO, ZnO, La2O3, Nb2O5, TiO2, HfO, and Sb2O3; providing a mask layer over the waveguide, the mask layer having a pattern corresponding to the one or more diffractive gratings, the pattern selectively exposing portions of the waveguide; and anisotropically etching the exposed portions of the waveguide to define the one or more diffractive gratings in the waveguide. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A plasma etching process for forming features in a high refractive index glass substrate, the process comprising:
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providing a patterned mask layer on at least a portion of the high refractive index glass substrate, the substrate formed of glass having a refractive index of greater than or equal to about 1.65 and comprising less than about 50 wt % SiO2, and etching the features in the substrate by exposing the mask layer and high refractive index glass substrate to a plasma etch comprising chemical and physical etchant species to selectively remove exposed high refractive index glass from the high refractive index glass substrate. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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24. A process for forming features in a high refractive index glass substrate, the process comprising:
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selectively exposing a portion of the high refractive index glass substrate to a plasma in a reaction chamber to selectively remove high refractive index glass from the high refractive index glass substrate; wherein the high refractive index glass substrate comprises less than about 50 wt % SiO2 and has a refractive index of greater than or equal to about 1.65. - View Dependent Claims (25, 26, 27, 28)
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29-38. -38. (canceled)
Specification