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METHOD OF MONITORING PROCESSING SYSTEM FOR PROCESSING SUBSTRATE

  • US 20180224817A1
  • Filed: 02/08/2017
  • Published: 08/09/2018
  • Est. Priority Date: 02/08/2017
  • Status: Active Grant
First Claim
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1. A method of monitoring a processing system for processing a substrate, comprising:

  • acquiring data from the processing system for a plurality of parameters, the data comprising a plurality of data values;

    grouping the parameters into a plurality of sub-groups, each of the sub-groups comprising a plurality of correlated parameters;

    constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, comprising;

    normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and

    determining a statistical quantity using the PCA model.

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