×

Scanning Ferromagnetic Resonance (FMR) for Wafer-Level Characterization of Magnetic Films and Multilayers

  • US 20180267128A1
  • Filed: 03/20/2017
  • Published: 09/20/2018
  • Est. Priority Date: 03/20/2017
  • Status: Active Grant
First Claim
Patent Images

1. A ferromagnetic resonance (FMR) measurement system for a wafer under test (WUT) on which one or a plurality of magnetic films are formed, comprising:

  • (a) a waveguide transmission line (WGTL) connected to a generator of microwaves;

    (b) a magnet that provides a magnetic field which together with a simultaneous application of a microwave frequency is configured to induce a magnetic resonance condition in the one or plurality of magnetic films; and

    (c) a system for detecting microwave absorbance by the one or plurality of magnetic films when a magnetic resonance condition is established wherein the WGTL and WUT are configured to move laterally and vertically relative to one another such that the WGTL contacts, or is placed proximate to the WUT at predetermined positions.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×