WAVEGUIDES WITH LIGHT ABSORBING FILMS AND PROCESSES FOR FORMING THE SAME
First Claim
Patent Images
1. An optical device comprising:
- an optical waveguide comprising a first surface; and
a light absorber directly on at least the first surface, wherein the light absorber comprises a film comprising at least one of an allotrope of carbon and black silicon.
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Abstract
In some embodiments, a display device includes one or more waveguides having a vapor deposited light absorbing film on edges of the waveguide to mitigate ghost images. In some embodiments, the film is formed directly on the edge of the waveguide by a vapor deposition, such as an evaporative deposition process. In some embodiments, the light absorbing films may comprise carbon, for example carbon in the form of one or more allotropes of carbon, such as fullerenes, or black silicon.
12 Citations
22 Claims
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1. An optical device comprising:
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an optical waveguide comprising a first surface; and a light absorber directly on at least the first surface, wherein the light absorber comprises a film comprising at least one of an allotrope of carbon and black silicon. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A display device comprising:
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an optical waveguide comprising first and second major surfaces and edge surfaces extending therebetween; a spatial light modulator; an image injection device configured to inject light from the spatial light modulator into the waveguide; a light absorber on at least one edge surface, wherein the light absorber comprises a film comprising at least one of an allotrope of carbon and silicon, and wherein the light absorber absorbs at least 70% of incident light having a wavelength ranging from 350 to 850 nm. - View Dependent Claims (13, 14)
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15. A process for forming a light absorber on an optical waveguide, the process comprising:
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providing the optical waveguide in a reaction chamber, the waveguide comprising a first surface; forming a light absorbing film on the first surface, wherein forming the light absorbing film comprises; contacting the first surface with airborne precursor species in the reaction chamber to deposit a thin film of the precursor species directly on the first surface, wherein the thin film comprises at least one of an allotrope of carbon and silicon, and wherein the deposited thin film absorbs at least 70% of incident light having a wavelength ranging from 350 to 850 nm. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22)
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Specification