PLASMA REACTOR WITH ELECTRON BEAM OF SECONDARY ELECTRONS
First Claim
1. An electron beam plasma reactor comprising:
- a plasma chamber having a side wall;
an upper electrode;
a workpiece support to hold a workpiece facing the upper electrode, wherein the workpiece on the support has a clear view of the upper electrode;
a first RF power source coupled to said upper electrode;
a gas supply;
a vacuum pump coupled to the chamber to evacuate the chamber;
a controller configured to operate the first RF power source to apply an RF power to upper electrode, and to operate the gas distributor and vacuum pump, so as to create a plasma in an upper portion of the chamber that generates an electron beam from the upper electrode toward the workpiece and a lower electron-temperature plasma in a lower portion of the chamber including the workpiece.
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Accused Products
Abstract
An electron beam plasma reactor includes a plasma chamber having a side wall, an upper electrode, a workpiece support to hold a workpiece facing the upper electrode with the workpiece on the support having a clear view of the upper electrode, a first RF power source coupled to said upper electrode, a gas supply, a vacuum pump coupled to the chamber to evacuate the chamber, and a controller. The controller is configured to operate the first RF power source to apply an RF power to upper electrode, and to operate the gas distributor and vacuum pump, so as to create a plasma in an upper portion of the chamber that generates an electron beam from the upper electrode toward the workpiece and a lower electron-temperature plasma in a lower portion of the chamber including the workpiece.
27 Citations
18 Claims
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1. An electron beam plasma reactor comprising:
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a plasma chamber having a side wall; an upper electrode; a workpiece support to hold a workpiece facing the upper electrode, wherein the workpiece on the support has a clear view of the upper electrode; a first RF power source coupled to said upper electrode; a gas supply; a vacuum pump coupled to the chamber to evacuate the chamber; a controller configured to operate the first RF power source to apply an RF power to upper electrode, and to operate the gas distributor and vacuum pump, so as to create a plasma in an upper portion of the chamber that generates an electron beam from the upper electrode toward the workpiece and a lower electron-temperature plasma in a lower portion of the chamber including the workpiece. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of processing a workpiece in a plasma reactor, comprising:
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supporting a workpiece in a chamber of the plasma reactor such that the workpiece faces an upper electrode and has a clear view of an upper electrode; introducing a gas into the chamber; and applying a first RF power to the upper electrode so as to create a plasma in an upper portion of the chamber such that ions of the plasma impact the upper electrode and generate an electron beam of secondary electrons from the upper electrode toward the workpiece, wherein a first portion of the electron beam impinges the workpiece. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18)
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Specification