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ELECTRON BEAM IRRADIATION APPARATUS AND ELECTRON BEAM DYNAMIC FOCUS ADJUSTMENT METHOD

  • US 20180284620A1
  • Filed: 02/13/2018
  • Published: 10/04/2018
  • Est. Priority Date: 03/30/2017
  • Status: Active Grant
First Claim
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1. An electron beam irradiation apparatus comprising:

  • an emission source configured to emit an electron beam;

    a deflector configured to deflect the electron beam to a desired position on a surface of a target object;

    an objective lens configured to focus the electron beam to form an image on the surface of the target object;

    a first electrode being annular, arranged along an optical axis of the electron beam, at a position downstream from the deflector, and in a magnetic field of the objective lens, in which a first aperture is formed in a central portion such that the electron beam passes through it, and to which a first potential being positive is variably applied;

    a second electrode being annular, arranged in the magnetic field of the objective lens and between the deflector and the first electrode, in which a second aperture is formed in a central portion such that the electron beam passes through it, and to which a second potential being positive and higher than the first potential is applied; and

    a third electrode being annular, arranged in the magnetic field of the objective lens and at a position opposite to the second electrode with respect to the first electrode, in which a third aperture is formed in a central portion such that the electron beam passes through it, and to which a third potential lower than the first potential is applied.

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