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SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

  • US 20180308707A1
  • Filed: 02/26/2018
  • Published: 10/25/2018
  • Est. Priority Date: 04/25/2017
  • Status: Active Grant
First Claim
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1. A semiconductor manufacturing apparatus, comprising:

  • a container in which a processing chamber is installed;

    a stage installed in the processing chamber and configured to hold a semiconductor substrate;

    a gas supply line configured to supply reactive gas to the processing chamber; and

    a vacuum line configured to exhaust the processing chamber,wherein the semiconductor substrate includes a high-k insulating film, andas the reactive gas, mixed gas including complex-forming gas forming a volatile organometallic complex by reacting with a metal element included in the high-k insulating film and complex stabilizing material gas that increases stability of the organometallic complex is supplied.

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