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THIN-FILM TRANSISTOR, METHOD OF FABRICATING THIN-FILM TRANSISTOR, AND DISPLAY DEVICE

  • US 20180315858A1
  • Filed: 07/06/2018
  • Published: 11/01/2018
  • Est. Priority Date: 12/03/2014
  • Status: Active Grant
First Claim
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1. A method of fabricating a thin-film transistor, the method comprising:

  • forming an oxide semiconductor layer above a substrate;

    forming a gate insulating layer above the oxide semiconductor layer;

    forming a gate electrode above the gate insulating layer; and

    forming a metal oxide layer on the oxide semiconductor layer by reactive sputtering to reduce a resistance of the oxide semiconductor layer in a region in contact with the metal oxide layer.

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