HOMOGENEOUS PROCESS FOR HYDRODEHALOGENATING HALOGENATED HETEROARYL COMPOUNDS
First Claim
1. A homogeneous process for hydrodehalogenating a halo-substituted C3-C20 heteroaryl starting material to form a non-halogenated C3-C20 heteroaryl product and/or a halo-substituted C3-C20 heteroaryl product, wherein the halo-substituted C3-C20 heteroaryl product has at least one less halogen substituent than the halo-substituted C3-C20 heteroaryl starting material, the process comprising the step of:
- hydrogenating the halo-substituted C3-C20 heteroaryl starting material in the presence of a rhodium or ruthenium complex, molecular hydrogen, a base and a solvent, wherein the process is carried out in a monophasic solvent system and the molar ratio of base to each halogen substituent to be removed is at least 1;
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Abstract
The present invention provides a homogeneous process for hydrodehalogenating a halo-substituted C3-C20 heteroaryl starting material to form a non-halogenated C3-C20 heteroaryl product and/or a halo-substituted C3-C20 heteroaryl product, wherein the halo-substituted C3-C20 heteroaryl product has at least one less halogen substituents than the halo-substituted C3-C20 heteroaryl starting material, the process comprising the step of hydrogenating the halo-substituted C3-C20 heteroaryl starting material in the presence of a rhodium or ruthenium complex, molecular hydrogen, a base and a solvent, wherein the process is carried out in a monophasic solvent system and the molar ratio of base to each halogen substituent to be removed is at least 1:1.
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Citations
26 Claims
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1. A homogeneous process for hydrodehalogenating a halo-substituted C3-C20 heteroaryl starting material to form a non-halogenated C3-C20 heteroaryl product and/or a halo-substituted C3-C20 heteroaryl product, wherein the halo-substituted C3-C20 heteroaryl product has at least one less halogen substituent than the halo-substituted C3-C20 heteroaryl starting material, the process comprising the step of:
hydrogenating the halo-substituted C3-C20 heteroaryl starting material in the presence of a rhodium or ruthenium complex, molecular hydrogen, a base and a solvent, wherein the process is carried out in a monophasic solvent system and the molar ratio of base to each halogen substituent to be removed is at least 1;
1.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
Specification