Functionalized Cyclosilazanes as Precursors For High Growth Rate Silicon-Containing Films
First Claim
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1. A silicon precursor compound according to one of Formulae A, B, C, D, or E:
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Abstract
Described herein are functionalized cyclosilazane precursor compounds and compositions and methods comprising same to deposit a silicon-containing film such as, without limitation, silicon oxide, silicon nitride, silicon oxynitride, silicon carbonitride, silicon oxycarbonitride, or carbon-doped silicon oxide via a thermal atomic layer deposition (ALD) or plasma enhanced atomic layer deposition (PEALD) process, or a combination thereof.
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17 Claims
- 1. A silicon precursor compound according to one of Formulae A, B, C, D, or E:
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4. A composition comprising at least one silicon precursor compound selected from one of Formulae B, C, or E:
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