SUBSTRATE PROVIDED WITH A STACK HAVING THERMAL PROPERTIES COMPRISING AT LEAST ONE NICKEL OXIDE LAYER

• US 20180362397A1
• Filed: 12/01/2016
• Published: 12/20/2018
• Est. Priority Date: 12/02/2015
• Status: Active Grant

• Current Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Original Assignee: Saint-Gobain Glass France (Compagnie De Saint-Gobain)
• Inventors: GUIMARD, Denis, MARIANI, Silvia
• Granted Patent: US 10,457,591 B2
• Time in Patent Office: Days
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/3652 the coating stack containing at least one sacrificial layer to protect the metal from oxidation
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: C03C 17/3681 the multilayer coating being used in glazing, e.g. windows or windscreens
• CPC Class Codes: C03C 2217/216 ZnO
• CPC Class Codes: C03C 2217/217 FeOx, CoOx, NiOx
• CPC Class Codes: C03C 2217/256 Ag
• CPC Class Codes: C03C 2217/73 Anti-reflective coatings with specific characteristics

Abstract

A transparent substrate is provided, on a main face, with a stack of thin layers including at least one, metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coatings. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. At least one nickel oxide Ni_xO layer is located under the functional layer in the direction of the substrate and/or above the functional layer, with interposition of at least one layer or of just one layer made of a different material between the or each nickel oxide Ni_xO layer and the functional layer.

Claims

1. A transparent substrate provided, on a main face, with a stack of thin layers comprising at least one metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, and two antireflective coatings, said antireflective coatings each comprising at least one dielectric layer, said functional layer being positioned between the two antireflective coatings, wherein at least one nickel oxide Ni_xO layer is located under said functional layer in the direction of the substrate and/or above said functional layer, with interposition of at least one layer or of just one layer made of a different material between said nickel oxide Ni_xO layer and said functional layer.

2. The substrate as claimed in claim 1, wherein a single oxide-based layer is interposed under said functional layer in the direction of the substrate, between said nickel oxide Ni_x O layer and said functional layer.

3. The substrate as claimed in claim 1, wherein a single metallic layer is interposed between said nickel oxide Ni_xO layer and said functional layer under said functional layer in the direction of the substrate and/or above said functional layer on the opposite side from the substrate.

4. The substrate as claimed in claim 1, wherein a metallic layer is located under and in contact with the functional layer, with a physical thickness of said metallic layer of at least 0.3 nm and an oxide-based layer interposed between said metallic layer and said nickel oxide Ni_xO layer which is located under said functional layer in the direction of the substrate.

5. The substrate as claimed in claim 1, wherein a layer based on zinc oxide is located below and in contact with said nickel oxide Ni_xO layer.

6. The substrate as claimed in claim 1, wherein said nickel oxide Ni_xO layer exhibits an x between 1.2 and 0.5.

7. The substrate as claimed in claim 1, wherein the physical thickness of said nickel oxide Ni_xO layer is between 0.3 and 10.0 nm.

8. The substrate as claimed in claim 1, wherein the physical thickness of the only or of all the layers interposed between said nickel oxide Ni_xO layer and said functional layer is between 0.5 and 15.0 nm.

9. The substrate as claimed in claim 1, wherein two nickel oxide layers in contact with one another are located under said functional layer in the direction of the substrate and/or above said functional layer the nickel oxide Ni_yO layer closest to said functional layer being less oxidized than the other, more distant, nickel oxide Ni_xO layer.

10. The substrate as claimed in claim 1, wherein said underlying antireflective and overlying antireflective coatings each comprise at least one dielectric layer based on silicon nitride.

11. A glazing comprising at least one substrate as claimed in claim 1.

12. The glazing as claimed in claim 11, mounted as a monolithic unit or as a multiple glazing unit of the double glazing or triple glazing or laminated glazing type, wherein at least the substrate carrying the stack is bent and/or tempered.

13. A method of using the substrate as claimed in claim 1, for comprising producing a transparent electrode of a heated glazing or of an electrochromic glazing or of a lighting device or of a display device or of a photovoltaic panel from the substrate.

14. The substrate as claimed in claim 1, wherein the functional layer is based on silver or on silver-containing metal alloy.

15. The substrate as claimed in claim 2, wherein the single oxide-based layer is a layer based on zinc oxide.

16. The substrate as claimed in claim 3, wherein the single oxide-based layer is a layer comprising Ni and/or Cr or a layer comprising Ge.

17. The substrate as claimed in claim 4, wherein the metallic layer comprises nickel and chromium and the thickness of the metallic layer is between 1.0 and 5.0 nm, and the oxide-based layer is a layer based on zinc oxide.

18. The substrate as claimed in claim 6, wherein said nickel oxide Ni_xO layer exhibits an x between 0.9 and 0.6.

19. The substrate as claimed in claim 7, wherein the physical thickness of said nickel oxide Ni_xO layer between 1.0 and 5.0 nm.

20. The substrate as claimed in claim 8, wherein the physical thickness of the only or of all the layers interposed between said nickel oxide Ni_xO layer and said functional layer is between 1.0 and 6.0 nm.