Distortion Correction Method and Electron Microscope

• US 20180366295A1
• Filed: 06/19/2018
• Published: 12/20/2018
• Est. Priority Date: 06/20/2017
• Status: Active Grant

• Current Assignee: JEOL Limited
• Original Assignee: JEOL Limited
• Inventors: Morishita, Shigeyuki
• Granted Patent: US 10,446,362 B2
• Time in Patent Office: Days
• CPC Class Codes: H01J 2237/153 Correcting image defects, e.g. stigmators
• CPC Class Codes: H01J 2237/1534 Aberrations
• CPC Class Codes: H01J 2237/24585 Other variables, e.g. energy, mass, velocity, time, temperature
• CPC Class Codes: H01J 2237/2802 Transmission microscopes
• CPC Class Codes: H01J 37/14 magnetic
• CPC Class Codes: H01J 37/153 Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
• CPC Class Codes: H01J 37/226 Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence
• CPC Class Codes: H01J 37/302 Controlling tubes by external information, e.g. programme control H01J37/304 takes precedence

Abstract

There is provided a method which is for use in a charged particle beam system including an illumination system equipped with an aberration corrector having a plurality of stages of multipole elements and a transfer lens system disposed between the multipole elements, the method being capable of correcting distortion in a shadow of an aperture of the illumination system. The method involves varying excitations of the transfer lens system to correct distortion in the shadow of the aperture of the illumination system.

Claims

1. A method of distortion correction for use in a charged particle beam system including an illumination system having a built-in aberration corrector which contains a plurality of multipole elements and a transfer lens system disposed between the multipole elements to correct distortion in a shadow of an aperture of the illumination system, said method comprising:

varying excitations of the transfer lens system to correct the distortion in the shadow of the aperture.

2. The method of distortion correction as set forth in claim 1, wherein said transfer lens system comprises a first transfer lens and a second transfer lens.

3. The method of distortion correction as set forth in claim 2, wherein during the step of correcting the distortion in the shadow of said aperture, excitations of said first and second transfer lenses are varied in such a manner that the excitations are both increased or both decreased.

4. The method of distortion correction as set forth in claim 2, further comprising varying excitations of said transfer lens system to correct on-axis aberration.

5. The method of distortion correction as set forth in claim 4, wherein during the step of correcting said on-axis aberration, excitations of said first and second transfer lenses are varied such that the excitation of one of the first and second transfer lenses is increased while the excitation of the other is decreased.

6. The method of distortion correction as set forth in claim 4, wherein each of said plurality of multipole elements produces a three-fold field, and wherein during the step of correcting said on-axis aberration, three-lobe aberration is corrected.

7. The method of distortion correction as set forth in claim 1, wherein each of said plurality of multipole elements produces a three-fold field, and wherein during the step of correcting the distortion in the shadow of said aperture, three-fold symmetric distortion in the shadow of said aperture is corrected.

8. The method of distortion correction as set forth in claim 1, wherein said charged particle beam system is a scanning transmission electron microscope.

9. A charged particle beam system comprising:

an illumination system including an aberration corrector and an aperture, the aberration corrector containing a plural stages of multipole elements and a transfer lens system disposed between the multipole elements;

a distortion measuring section for measuring distortion in a shadow of the aperture; and

a controller for controlling the aberration corrector,

wherein the controller provides control based on a result of measurement of the distortion in the shadow of the aperture to vary excitations of the transfer lens system.

10. The charged particle beam system as set forth in claim 9, wherein said transfer lens system comprises a first transfer lens and a second transfer lens.

11. The charged particle beam system as set forth in claim 10, wherein said controller varies excitations of said first and second transfer lenses based on a result of the measurement of the distortion in the shadow of said aperture such that the excitations are both increased or both decreased.

12. The charged particle beam system as set forth in claim 10, further comprising an on-axis aberration measuring section for measuring on-axis aberration, and wherein said controller provides control based on a result of the measurement of the on-axis aberration to vary the excitations of said transfer lens system.

13. The charged particle beam system as set forth in claim 12, wherein said controller varies excitations of said first and second transfer lenses based on a result of the measurement of said on-axis aberration such that the excitation of one of the first and second transfer lenses is increased while the excitation of the other is decreased.