SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
First Claim
Patent Images
1. A semiconductor device, comprising:
- a source select line including a first conductive layer and a second conductive layer disposed on the first conductive layer;
word lines stacked over the source select line while being spaced apart from one another;
a channel layer which passes through the word lines and the source select line and further protrudes toward a lower direction than the source select line; and
a source structure which is disposed under the source select line and is in direct contact with a lateral wall of the channel layer.
1 Assignment
0 Petitions
Accused Products
Abstract
A semiconductor device and a method of manufacturing a semiconductor device may be provided. The semiconductor device may include a source select line. The semiconductor device may include word lines. The semiconductor device may include a channel layer. The semiconductor device may include a source structure. The source structure may be disposed under the source select line. The source structure may be in contact with the channel layer.
-
Citations
18 Claims
-
1. A semiconductor device, comprising:
-
a source select line including a first conductive layer and a second conductive layer disposed on the first conductive layer; word lines stacked over the source select line while being spaced apart from one another; a channel layer which passes through the word lines and the source select line and further protrudes toward a lower direction than the source select line; and a source structure which is disposed under the source select line and is in direct contact with a lateral wall of the channel layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
-
Specification