WAFER STORAGE CONTAINER

• US 20180374731A1
• Filed: 12/21/2016
• Published: 12/27/2018
• Est. Priority Date: 12/24/2015
• Status: Active Grant

• Current Assignee: Bum J.E. Woo, Pico & Tera Co., Ltd.
• Original Assignee: Bum J.E. Woo, Pico & Tera Co., Ltd.
• Inventors: WOO, Bum Je, YOON, Seok Mun, HAN, Myoung Sok, KIM, Hyun Sin
• Granted Patent: US 10,847,395 B2
• Time in Patent Office: Days
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence
• CPC Class Codes: H01L 21/6732 Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
• CPC Class Codes: H01L 21/67383 characterised by substrate supports
• CPC Class Codes: H01L 21/67389 characterised by atmosphere control
• CPC Class Codes: H01L 21/67393 characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl

Abstract

The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container comprising a storage chamber forming an independent space separated from the wafer storage container, and a plurality of gas chambers communicating with the storage chamber, so that the gases are being supplied or exhausted through the area of the side surfaces of the storage chamber via the gas chambers in order to remove the fumes remaining on the surface of a wafer stored inside the wafer storage container efficiently,

Claims

1. A wafer storage container comprising:

a storage chamber wherein the wafers are stored;

a gas hole located in the lower side of the storage chamber; and

a gas chamber communicating with the gas holes, located in the outer side surface of the storage chamber so as to be communicating with the storage chamber.

2. The wafer storage container according to claim 1,

wherein the gas chamber comprises a plurality of gas chambers;

the gas hole comprises a plurality of gas holes;

at least one of the gas chambers supplies gas to the storage chamber; and

at least one of the gas chambers exhausts gas from the storage chamber.

3. The wafer storage container according to claim 1,

wherein the gas chamber comprises a plurality of gas chambers;

the gas hole comprises a plurality of gas holes; and

at least two of the gas chambers are commonly communicating with one of the gas holes.

4. The wafer storage container according to claim 1,

wherein a communicating hole communicating with the gas hole is formed in the lower side of the gas chamber.

5. The wafer storage container according to claim 4,

wherein a pathway connecting the gas hole and the gas chamber is formed in the lower side of the storage chamber.

9. The wafer storage container according to claim 1,

wherein the gas hole comprises:

a pair of front gas holes located at the front with respect to the center point of the wafer stored in the storage chamber; and

a pair of rear gas holes located at the rear with respect to the center point of the wafer stored in the storage chamber.

10. The wafer storage container according to claim 1,

wherein the gas chamber comprises:

a first and a second gas chambers located respectively in the front left and the front right of the outer side surface with respect to the center point of the wafer stored in the storage chamber;

a third and a fourth gas chambers located respectively in the rear left and the rear right of the outer side surface with respect to the center point of the wafer stored in the storage chamber; and

a fifth and a sixth gas chambers respectively located in the rear sides of the third and the fourth gas chambers and in the outer side surface of the storage chamber.

11. The wafer storage container according to claim 10,

wherein the first to fourth gas chambers are communicating with the front gas holes respectively, and the fifth and sixth gas chambers are communicating with the rear gas holes respectively.

12. The wafer storage container according to claim 1,

wherein a lower plate installed in the bottom surface of the storage chamber is included so that the gas holes are not exposed to the storage chamber.

13. The wafer storage container according to claim 12,

wherein a pathway is formed inside the lower plate for connecting the gas hole and the communicating hole.

14. The wafer storage container according to claim 1,

wherein a reverse flow protection means for preventing the reverse flow of the gas is formed between the gas hole and the gas chamber.

15. The wafer storage container according to claim 1,

wherein it further includes:

a first lower plate constituting the bottom surfaces of the storage chamber and the gas chamber;

a second lower plate located in the lower side of the first lower plate; and

a third lower plate located in the lower side of the second lower plate, and

wherein a communicating hole is formed in the storage chamber of the first lower plate, and the gas hole is formed in the third lower plate, and a pathway is formed for connecting the gas hole and the communicating hole.

16. The wafer storage container according to claim 1,

wherein the storage chamber and the gas chamber are formed to be independent spaces from each other in the side surface of the storage chamber with a separation wall interposed therebetween, and a plurality of holes wherein gas is communicating is formed in the form of a matrix in the separation wall.

17. The wafer storage container according to claim 1,

wherein the storage chamber and the gas chamber are formed to be independent spaces from each other in the side surface of the storage chamber with a separation wall interposed therebetween, and a plurality of holes wherein gas is communicating is formed in the zigzag form.

18. The wafer storage container according to claim 1,

wherein the storage chamber and the gas chamber are formed to be independent spaces from each other in the side surface of the storage chamber with a separation wall interposed therebetween, and the separation wall is formed to be a curved shape having a curvature.

19. The wafer storage container according to claim 1,

wherein the gas is being filled inside the storage chamber by using the separation wall located in the side surface of the storage chamber and formed with a plurality of holes, and an outer wall spaced apart from the separation wall and having a curvature same as the separation wall.

20. The wafer storage container according to claim 1,

wherein a plurality of supporting bars installed in the storage chamber and supporting the wafers are included.

21. The wafer storage container according to claim 1,

wherein the gas chamber comprises a plurality of gas chambers and reinforcing columns are installed between the gas chambers.

6-8. -8. (canceled)

22-24. -24. (canceled)