THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SAME AND SEMICONDUCTOR DEVICE COMPRISING SAID THIN FILM TRANSISTOR
First Claim
1. A thin film transistor in which a gate electrode, a gate insulating film, and an oxide semiconductor film are laminated on a substrate,a source region and a drain region are formed on both outer sides of the oxide semiconductor film in a width direction,a channel region is formed in a region between the source region and the drain region,a source electrode is connected to the source region, anda drain electrode is connected to the drain region,wherein fluorine is contained in the gate insulating film, and a ratio (W/L) of a width W to a length L of the channel region is less than 8.
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Abstract
A thin film transistor having a high operation speed with a field effect mobility greater than 20 cm2/Vs and a method for manufacturing the same, and a semiconductor device having the same are provided. A thin film transistor in which a gate electrode, a gate insulating film and an oxide semiconductor film are laminated on a substrate, a source region and a drain region are respectively formed in outer portions of the oxide semiconductor film in the width direction, and a channel region is formed in a region between the source region and the drain region; and a source electrode is connected to the source region, while a drain electrode is connected to the drain region. The gate insulating film contains fluorine; and the ratio of the width W of the channel region to the length L thereof, namely W/L is less than 8.
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Citations
12 Claims
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1. A thin film transistor in which a gate electrode, a gate insulating film, and an oxide semiconductor film are laminated on a substrate,
a source region and a drain region are formed on both outer sides of the oxide semiconductor film in a width direction, a channel region is formed in a region between the source region and the drain region, a source electrode is connected to the source region, and a drain electrode is connected to the drain region, wherein fluorine is contained in the gate insulating film, and a ratio (W/L) of a width W to a length L of the channel region is less than 8.
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7. A method for manufacturing a thin film transistor in which a gate electrode, a gate insulating film, and an oxide semiconductor film are laminated on a substrate,
a source region and a drain region are formed on both outer sides of the oxide semiconductor film in a width direction, a channel region is formed in a region between the source region and the drain region, a source electrode is connected to the source region, and a drain electrode is connected to the drain region, the method comprising: -
forming a gate insulating film containing fluorine as the gate insulating film; and forming the source region and the drain region on the oxide semiconductor film so that a ratio (W/L) of a width W to a length L of the channel region is less than 8. - View Dependent Claims (8, 9, 10, 11)
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Specification