PROCESS FOR MANUFACTURING AN IMPLANT FOR FOCAL ELECTRICAL STIMULATION OF A NERVOUS STRUCTURE
First Claim
1. Process for manufacturing at least one implant for focal electrical stimulation or reception of a nervous structure, said implant being of the type comprising, on a substrate, a network forming cavities at the bottom of which are arranged microelectrodes, the cavities being delimited by erected walls of the network surrounding the electrodes,wherein the substrate is previously prepared by implementing the following steps:
- planar depositing and etching on a planar insulating substrate of;
electrical contacts, first electrical tracks, second electrical tracks separated from the first electrical tracks, and microelectrodes so that the electrical contacts, first and second electrical tracks and microelectrodes belong to the same basic plane,the first electrical tracks electrically connecting the microelectrodes and electrical contacts,the second electrical tracks being electrically connected to a ground,depositing an insulating layer on the planar substrate, electrical tracks and microelectrodes,etching the insulating layer to make openings at the electrical contacts and microelectrodes,forming a network of erected walls above the insulating layer and basic plane, and forming cavities around the microelectrodes.
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Accused Products
Abstract
The invention relates to a process for manufacturing at least one implant for focal electrical stimulation of a nervous structure, said implant being of the type including in a supporting structure a network of cavities at the bottom of which are placed microelectrodes, the cavities being bounded by walls erected and located around the microelectrodes, the supporting structure being produced beforehand by implementing the following steps: deposition and etching, in a planar manner, on an insulating substrate, of electrical contacts, of electrical tracks and of microelectrodes, first tracks electrically connecting the microelectrodes and the electrical contacts, second electrical tracks being electrically connected to a ground.
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Citations
15 Claims
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1. Process for manufacturing at least one implant for focal electrical stimulation or reception of a nervous structure, said implant being of the type comprising, on a substrate, a network forming cavities at the bottom of which are arranged microelectrodes, the cavities being delimited by erected walls of the network surrounding the electrodes,
wherein the substrate is previously prepared by implementing the following steps: -
planar depositing and etching on a planar insulating substrate of; electrical contacts, first electrical tracks, second electrical tracks separated from the first electrical tracks, and microelectrodes so that the electrical contacts, first and second electrical tracks and microelectrodes belong to the same basic plane, the first electrical tracks electrically connecting the microelectrodes and electrical contacts, the second electrical tracks being electrically connected to a ground, depositing an insulating layer on the planar substrate, electrical tracks and microelectrodes, etching the insulating layer to make openings at the electrical contacts and microelectrodes, forming a network of erected walls above the insulating layer and basic plane, and forming cavities around the microelectrodes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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Specification