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SEMICONDUCTOR DEVICE

  • US 20190088288A1
  • Filed: 02/15/2018
  • Published: 03/21/2019
  • Est. Priority Date: 09/20/2017
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a plurality of first interconnections that are oxide semiconductors formed in parallel at predetermined intervals in a first direction;

    a plurality of gate dielectric films that are formed on surfaces of the first interconnections, respectively; and

    a plurality of second interconnections that are conductors formed at predetermined intervals in parallel to a second direction orthogonal to the first direction, respectively, to bridge over the gate dielectric films.

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