SYSTEM AND METHOD FOR PLASMA IGNITION
First Claim
Patent Images
1. A method for igniting plasma in a direct current (DC) plasma system, the method comprising:
- providing an applied voltage to a plasma chamber of a direct current (DC) powered plasma system at a first voltage level, the first voltage level different from an operating direct current (DC) voltage of the plasma chamber;
changing the applied voltage provided to the plasma chamber to a second voltage level, wherein the second voltage is different from the operating voltage of the plasma chamber and the operating voltage is between the first voltage level and the second voltage level; and
returning the applied voltage to the plasma chamber to the first voltage level, wherein the voltage applied to the plasma chamber is changed between the first voltage and the second voltage until a plasma is ignited in the plasma chamber.
1 Assignment
0 Petitions
Accused Products
Abstract
This disclosure is generally directed to controlling energy distribution to a load, especially when anomalous events are detected. Benefits of the present disclosure include minimizing the length of a discharge event, mitigating the effects of an electrical discharge, and to improvements in inducing the ignition of a plasma. Methods and systems consistent with the present disclosure improve the control of operating conditions within a chamber and improve the ability for more rapidly initiating plasma ignition in a chamber.
25 Citations
19 Claims
-
1. A method for igniting plasma in a direct current (DC) plasma system, the method comprising:
-
providing an applied voltage to a plasma chamber of a direct current (DC) powered plasma system at a first voltage level, the first voltage level different from an operating direct current (DC) voltage of the plasma chamber; changing the applied voltage provided to the plasma chamber to a second voltage level, wherein the second voltage is different from the operating voltage of the plasma chamber and the operating voltage is between the first voltage level and the second voltage level; and returning the applied voltage to the plasma chamber to the first voltage level, wherein the voltage applied to the plasma chamber is changed between the first voltage and the second voltage until a plasma is ignited in the plasma chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. An apparatus for initiating plasma ignition in a direct current (DC) plasma system, the apparatus comprising:
a controller; and the controller controls an applied voltage to a plasma chamber of the DC plasma system at a first voltage level, the controller changes the applied voltage provided to the plasma chamber to a second voltage by affecting an upper supply rail connection to the DC plasma system, the controller changes the voltage applied to the plasma chamber between the first voltage level and the second voltage level by controlled connection of the upper supply rail to the DC plasma system, and the changing of the applied voltage level between the first voltage level and the second voltage level and back to the first voltage level is performed until plasma is ignited at the plasma chamber. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
-
17. An apparatus for initiating plasma ignition in a direct current (DC) plasma system, the apparatus comprising:
-
an upper rail and a lower rail that are disposed to form an electrical link between a DC plasma chamber and a first and a second output, respectively of a power supply; a plurality of switches that electrically couples a voltage changing circuit to at least one of the upper rail or the lower rail of the power supply when at least one of the plurality of switches are closed; and a control component coupled to the plurality of switches that controls switching between at least a first switch configuration and a second switch configuration, wherein the control component controls; the closure of at least a first switch of the plurality of switches to electrically couple the voltage changing circuit to at least one of the upper rail or the lower rail of the power supply to provide a first voltage to the DC plasma chamber, the closure of the first switch corresponding to the first switch configuration, the first switch and a second switch of the plurality of switches to open or close according to the second switch configuration, the second switch configuration providing a second voltage to the DC plasma chamber, switching between the first switch configuration and the second switch configuration until the ignition of the plasma occurs based on switching between the first voltage and the second voltage provided to the DC plasma chamber. - View Dependent Claims (18, 19)
-
Specification