SULFATE FREE PERSONAL CLEANSING COMPOSITION COMPRISING LOW INORGANIC SALT
First Claim
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1. A cleansing composition comprising:
- from about 3 wt % to about 35 wt % of an anionic surfactant;
from about 3 wt % to about 15% of an amphoteric surfactant;
from about 0.01 wt % to about 2 wt % of a cationic polymer;
from about 0 wt % to about 1.0 wt % of inorganic salts;
an aqueous carrier,wherein the composition is substantially free of sulfate based surfactant.
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Abstract
Personal cleansing compositions having an anionic surfactant, cationic deposition polymer, a level of inorganic salt of from about 0 to about 1 wt %, and an aqueous carrier. The composition is substantially free of sulfate containing surfactants. The composition can further comprise amphoteric surfactants. The composition remains phase stable, and minimizes coacervate formulation until after dilution with water.
31 Citations
20 Claims
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1. A cleansing composition comprising:
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from about 3 wt % to about 35 wt % of an anionic surfactant; from about 3 wt % to about 15% of an amphoteric surfactant; from about 0.01 wt % to about 2 wt % of a cationic polymer; from about 0 wt % to about 1.0 wt % of inorganic salts; an aqueous carrier, wherein the composition is substantially free of sulfate based surfactant. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 11, 12, 13, 14, 15, 16, 17)
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18. A cleansing composition comprising:
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from about 5 wt % to about 35 wt % of an anionic surfactant selected from amino acid based surfactants; from about 0.01 wt % to about 2 wt % cationic polymer; from about 0 wt % to about 1.0 wt % of inorganic salts; an aqueous carrier, wherein the composition is substantially free of sulfate based surfactant. - View Dependent Claims (19, 20)
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Specification