SULFATE FREE CLEAR PERSONAL CLEANSING COMPOSITION COMPRISING LOW INORGANIC SALT
First Claim
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1. A clear cleansing composition comprising:
- from about 3 wt % to about 35 wt % of an anionic surfactant;
from about 3 wt % to about 15% of an amphoteric surfactant;
from about 0.01 wt % to about 2 wt % cationic polymer;
from about 0 wt % to about 1.0 wt % of inorganic salts;
an aqueous carrier,wherein the composition is substantially free of sulfate based surfactant and wherein the composition has a % T value of greater than about 80.
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Abstract
A clear personal cleansing composition having an anionic surfactant, a cationic deposition polymer, an aqueous carrier and a level of inorganic salt of from about 0 to about 1 wt %. The composition is substantially free of sulfates and has a % T of greater than about 80%. The composition can further comprise amphoteric surfactants. The composition remains phase stable and minimizes coacervate formulation until after dilution with water.
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20 Claims
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1. A clear cleansing composition comprising:
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from about 3 wt % to about 35 wt % of an anionic surfactant; from about 3 wt % to about 15% of an amphoteric surfactant; from about 0.01 wt % to about 2 wt % cationic polymer; from about 0 wt % to about 1.0 wt % of inorganic salts; an aqueous carrier, wherein the composition is substantially free of sulfate based surfactant and wherein the composition has a % T value of greater than about 80. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A cleansing composition comprising:
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from about 5 wt % to about 35 wt % of an anionic surfactant selected from amino acid based surfactants; from about 0.01 wt % to about 2 wt % cationic polymer; from about 0 wt % to about 1.0 wt % of inorganic salts; an aqueous carrier, wherein the composition is substantially free of sulfate based surfactant and wherein the composition has a % T value of greater than about 80. - View Dependent Claims (19, 20)
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Specification