MEASUREMENT DEVICE AND MEASUREMENT METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
First Claim
1. A measurement device comprising:
- a mark detection system that has an irradiation system, an objective optical system and a beam receiving system, the irradiation system irradiating a grating mark provided at an object that is moved in a first direction, with a measurement beam, while scanning the measurement beam in the first direction with respect to the grating mark, the objective optical system including an objective optical element capable of facing the object that is moved in the first direction, and the beam receiving system receiving a diffraction beam from the grating mark of the measurement beam via the objective optical system; and
a calculation system that obtains positional information of the grating mark based on a detection result of the mark detection system, whereinthe objective optical element deflects or diffracts the diffraction beam generated at the grating mark toward the beam receiving system, the objective optical element attenuating a zero-order beam of the diffraction beam from the grating mark, and the objective optical element deflecting or diffracting a beam other than the zero-order beam toward the beam receiving system.
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Abstract
An alignment system is equipped with: an alignment system having an objective optical system, an irradiation system and a beam receiving system; and a calculation system, the objective optical system including an objective transparent plate that faces a wafer movable in a Y-axis direction, the irradiation system irradiating a grating mark provided at the wafer with measurement beams via the objective transparent plate while scanning the measurement beams in the Y-axis direction, the beam receiving system receiving diffraction beams from the grating mark of the measurement beams via the objective optical system, and the calculation system obtaining positional information of the grating mark on the basis of the output of the beam receiving system, wherein the objective transparent plate deflects or diffracts the diffraction beams diffracted at the grating mark toward the beam receiving system.
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Citations
19 Claims
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1. A measurement device comprising:
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a mark detection system that has an irradiation system, an objective optical system and a beam receiving system, the irradiation system irradiating a grating mark provided at an object that is moved in a first direction, with a measurement beam, while scanning the measurement beam in the first direction with respect to the grating mark, the objective optical system including an objective optical element capable of facing the object that is moved in the first direction, and the beam receiving system receiving a diffraction beam from the grating mark of the measurement beam via the objective optical system; and a calculation system that obtains positional information of the grating mark based on a detection result of the mark detection system, wherein the objective optical element deflects or diffracts the diffraction beam generated at the grating mark toward the beam receiving system, the objective optical element attenuating a zero-order beam of the diffraction beam from the grating mark, and the objective optical element deflecting or diffracting a beam other than the zero-order beam toward the beam receiving system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A measurement method of measuring positional information of a grating mark provided at an object, the method comprising:
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moving the object in a first direction, below an objective optical system including an objective optical element capable of facing the object; irradiating the grating mark of the object that is moved, with a measurement beam, while scanning the measurement beam in the first direction with respect to the grating mark; receiving a diffraction beam from the grating mark of the measurement beam with a beam receiving system via the objective optical system; and obtaining positional information of the grating mark based on an output of the beam receiving system, wherein the objective optical system deflects or diffracts the diffraction beam generated at the grating mark, toward the beam receiving system, the objective optical element attenuating a zero-order beam of the diffraction beam from the grating mark, and the objective optical element deflecting or diffracting a beam other than the zero-order beam toward the beam receiving system. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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Specification