SEMICONDUCTOR MANUFACTURED NANO-STRUCTURES FOR MICROBE OR VIRUS TRAPPING OR DESTRUCTION
First Claim
Patent Images
1. A method for damaging or destroying a microbe or a virion, comprising:
- forming an array of semiconductor protrusions extending from a surface of a semiconductor substrate, the semiconductor protrusions comprising nanospikes, the array of semiconductor protrusions having nanoscale dimensions, the array of semiconductor protrusions comprising a fractal pattern of spike sizes; and
disposing the microbe or the virion on the array of protrusions.
1 Assignment
0 Petitions
Accused Products
Abstract
A device for isolating a microbe or a virion includes a semiconductor substrate; and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate; wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.
2 Citations
7 Claims
-
1. A method for damaging or destroying a microbe or a virion, comprising:
-
forming an array of semiconductor protrusions extending from a surface of a semiconductor substrate, the semiconductor protrusions comprising nanospikes, the array of semiconductor protrusions having nanoscale dimensions, the array of semiconductor protrusions comprising a fractal pattern of spike sizes; and disposing the microbe or the virion on the array of protrusions. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
Specification