METHODS AND SYSTEMS FOR FABRICATION OF SHAPED FIBER ELEMENTS FOR SCANNING FIBER DISPLAYS
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0 Petitions
Accused Products
Abstract
A fiber optic element of a fiber scanning system includes a motion actuator having longitudinal side members, an internal orifice, a first support region, a central region, and a second support region. The fiber optic element also includes a first fiber optic cable passing through the internal orifice and having a first fiber joint as well as a second fiber optic cable passing through the internal orifice. The second fiber optic cable has a second fiber joint disposed in the central region and spliced to the first fiber joint, a second coupling region, a light delivery region, and a light emission tip. The light delivery region is characterized by a first diameter and the light emission tip is characterized by a second diameter less than the first diameter.
8 Citations
21 Claims
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1. (canceled)
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2. A method of fabricating a shaped fiber, the method comprising:
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providing a fiber optic cable; covering a portion of the fiber optic cable with an etch jacket to define an exposed region of the fiber optic cable and a covered region of the fiber optic cable; exposing the exposed region of the fiber optic cable and the etch jacket to an etchant solution; removing at least a portion of the exposed region of the fiber optic cable in response to exposure to the etchant solution; and wicking the etchant solution under at least a portion of the etch jacket to remove at least a portion of the covered region of the fiber optic cable. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9)
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10. A method of fabricating a tapered fiber emission tip, the method comprising:
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providing a fiber optic cable having an emission region and an emission face; coating the emission region and the emission face with an etch resistant mask; exposing a portion of the emission region adjacent the emission face to form a sidewall mask and an emission face mask; providing an etch solution; inserting the emission region into the etch solution; etching a portion of the emission region to form successively deeper etch profiles; determining an etch endpoint; and removing the emission region from the etch solution. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification